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Autor:
David Rafaja, Henrik Siegle, Mohammad Ghafari, Peter Schmollngruber, Gerhard Miehe, Horst Hahn, Paul Farber, B. Stahl, Nathalie Martz, Hartmut Fuess, Jörg Ebert, Michael Knapp
Publikováno v:
Thin Solid Films. 460:256-263
Annealing of the (1.1 nm Co90Fe10/2.2 nm Cu)×20 and (1.1 nm Co90Fe10/2.2 nm Cu85Ag10Au5)×20 multilayers at 235 °C improved their magnetoresistance as compared to the virgin samples. Annealing at higher temperatures resulted in degradation of the m