Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Peter Sanchez"'
Autor:
Johan Bylund, Vignesh Venkatakrishnan, Alicia Buck, Claes Dahlgren, Felix Peter Sanchez Klose, Karin Christenson, Arsham Khamzeh
Publikováno v:
ImmunoHorizons. 3:488-497
Neutrophils are capable of producing significant amounts of reactive oxygen species (ROS) by the phagocyte NADPH oxidase, which consists of membrane-bound and cytoplasmic subunits that assemble during activation. Neutrophils harbor two distinct pools
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3c7ef1c833034b07939c95a1d2b1df57
https://doi.org/10.4049/immunohorizons.1900062
https://doi.org/10.4049/immunohorizons.1900062
Autor:
Karin Christenson, Felix Peter Sanchez Klose, Lisa Davidsson, Johan Bylund, Alicia Buck, Agnes Dahlstrand Rudin, Lena Björkman
Publikováno v:
International Journal of Molecular Sciences
Volume 21
Issue 11
International Journal of Molecular Sciences, Vol 21, Iss 3750, p 3750 (2020)
Volume 21
Issue 11
International Journal of Molecular Sciences, Vol 21, Iss 3750, p 3750 (2020)
Gout is an inflammatory disease caused by monosodium urate (MSU) crystals. The role of neutrophils in gout is less clear, although several studies have shown neutrophil extracellular trap (NET) formation in acutely inflamed joints of gout patients. M
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d80fd63367fee656af16715e4540ab58
http://europepmc.org/articles/PMC7312864
http://europepmc.org/articles/PMC7312864
Akademický článek
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Autor:
Huamei Forsman, Claes Dahlgren, Marios Stylianou, Anna Karlsson, Agnes Dahlstrand Rudin, Johan Bylund, Amanda Welin, Felix Peter Sanchez Klose, Jonas Elmwall, Constantin F. Urban, Halla Björnsdottir, Karin Christenson
Publikováno v:
Frontiers in Immunology, Vol 8 (2017)
Neutrophils have the ability to capture and kill microbes extracellularly through the formation of neutrophil extracellular traps (NETs). These are DNA and protein structures that neutrophils release extracellularly and are believed to function as a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::82a074cbec021adbe7b04b8c04dcd520
http://urn.kb.se/resolve?urn=urn:nbn:se:umu:diva-133767
http://urn.kb.se/resolve?urn=urn:nbn:se:umu:diva-133767
Autor:
Kenneth H. Nilsen, Peter Sanchez
Publikováno v:
Proceedings of the Water Environment Federation. 2010:4907-4928
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d7538655e5649819283a32d11cd7a7c
https://doi.org/10.2175/193864710798182592
https://doi.org/10.2175/193864710798182592
Autor:
Pei-yang Yan, Barry Lieberman, Ted Liang, Emily Y. Shu, Seh-Jin Park, Guojing Zhang, Ping Qu, Alan R. Stivers, Gilroy Vandentop, Sven Henrichs, Erdem Ultanir, Peter Sanchez
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL) tool development achieved a big milestone last year as two full-field Alpha Demo Tools (ADT) were shipped to customers by ASML. In the future horizon, a full field "EUV1" exposure tool from Nikon will be availab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a24a465211f12bfefb302d0bae38c4db
https://doi.org/10.1117/12.728941
https://doi.org/10.1117/12.728941
Autor:
Chang Ju Choi, Emily Y. Shu, Seh-Jin Park, Eric J. Lanzendorf, Guojing Zhang, Alan R. Stivers, Gilroy Vandentop, Kangmin Hsia, Peter Sanchez, Jeff Farnsworth, Manish Chandhok, Pei-yang Yan, Michael J. Leeson, Yan Du, Ted Liang
Publikováno v:
SPIE Proceedings.
It becomes increasingly important to have an integrated process for Extreme UltraViolet (EUV) mask fabrication in order to meet all the requirements for the 32 nm technology node and beyond. Intel Corporation established the EUV mask pilot line by in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e6ce9eec27d37275143d35d5e2bc55ef
https://doi.org/10.1117/12.681839
https://doi.org/10.1117/12.681839
Autor:
Henry Yun, Peter Coon, Grace Ng, Anurag Mittal, Peter Sanchez, Daniel Tanzil, Florence Eschbach, Barbara Greenebaum, Archita Sengupta
Publikováno v:
SPIE Proceedings.
Photomask lifetime has become a challenge since the introduction of high volume manufacturing 193nm photolithograph. Photomask lifetime is being impacted by a broad range of environmental and process factors resulting in inorganics crystals and organ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4412fe7272953a7f13d292c4e107f902
https://doi.org/10.1117/12.617078
https://doi.org/10.1117/12.617078
Publikováno v:
SPIE Proceedings.
To reduce the risk of EUV lithography adaptation for the 32nm technology node in 2009, Intel has operated a EUV mask Pilot Line since early 2004. The Pilot Line integrates all the necessary process modules including common tool sets shared with curre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c89dbbd35def2f87b7eb765972722653
https://doi.org/10.1117/12.604717
https://doi.org/10.1117/12.604717
Autor:
Daniel Selassie, Florence Eschbach, Mahmood Toofan, Michael Murray, Daniel Tanzil, Peter Sanchez, Huiying Liu, Barbara Greenebaum, Vikram Tolani, Raul Villacorta
Publikováno v:
SPIE Proceedings.
The formation of photoinduced crystals and haze has become a challenge for 193nm photolithography high volume manufacturing (1-6). Extensive work has been performed to develop alternative to piranha chemistry for photomask cleaning processes in an at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28940665eacf656ff6c19f2f30f6831a
https://doi.org/10.1117/12.569272
https://doi.org/10.1117/12.569272