Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Peter R. Krauss"'
Autor:
Stephen Y. Chou, Peter R. Krauss
Publikováno v:
Microelectronic Engineering. 35:237-240
Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated. Nanoimprint lithography has demonstrated 10 nm feature size, 40 nm pitch, vertical and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::00b14e9f2b9c8070ac410331c089a72e
https://doi.org/10.1016/s0167-9317(96)00097-4
https://doi.org/10.1016/s0167-9317(96)00097-4
Publikováno v:
Scripta Metallurgica et Materialia. 33:1537-1544
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8478ee6f846109533b1ac5ec05e8da23
https://doi.org/10.1016/0956-716x(95)00396-d
https://doi.org/10.1016/0956-716x(95)00396-d
Autor:
Stephen Y. Chou, Peter R. Krauss
Publikováno v:
Applied Physics Letters. 71:3174-3176
Nano-compact disks (Nano-CDs) with 400 Gbit/in2 topographical bit density (nearly three orders of magnitude higher than commercial CDs) have been fabricated using nanoimprint lithography. The reading and wearing of such Nano-CDs have been studied usi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c4334dee3708370ea16ef8f9666cc1f
https://doi.org/10.1063/1.120280
https://doi.org/10.1063/1.120280
Publikováno v:
Applied Physics Letters. 71:1881-1883
We report the fabrication and characterization of nanoscale silicon field effect transistors using nanoimprint lithography. With this lithographic technique and dry etching, we have patterned a variety of nanoscale transistor features in silicon, inc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3fcec05ea064adc3b6f4ed9118f03012
https://doi.org/10.1063/1.119426
https://doi.org/10.1063/1.119426
Publikováno v:
Science. 272:85-87
A high-throughput lithographic method with 25-nanometer resolution and smooth vertical sidewalls is proposed and demonstrated. The technique uses compression molding to create a thickness contrast pattern in a thin resist film carried on a substrate,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::908232e05091b90fd4de4dd106c91741
https://doi.org/10.1126/science.272.5258.85
https://doi.org/10.1126/science.272.5258.85
Autor:
Stephen Y. Chou, Peter R. Krauss
Publikováno v:
Journal of Magnetism and Magnetic Materials. 155:151-153
A quantum magnetic disk (QMD) - a new paradigm for magnetic recording - is proposed and fabricated. Tile QMD consists of pre-fabricated single-domain magnetic structures that have an identical shape and are uniformly embedded in a nonmagnetic disk. E
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::405add757e22ee7c7f48783f2f937f02
https://doi.org/10.1016/0304-8853(95)00724-5
https://doi.org/10.1016/0304-8853(95)00724-5
Publikováno v:
Applied Physics Letters. 67:3114-3116
A nanoimprint process that presses a mold into a thin thermoplastic polymer film on a substrate to create vias and trenches with a minimum size of 25 nm and a depth of 100 nm in the polymer has been demonstrated. Furthermore, the imprint process has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2031690f5e6420bd890b911c35c3958
https://doi.org/10.1063/1.114851
https://doi.org/10.1063/1.114851
Publikováno v:
Journal of Applied Physics. 76:6673-6675
Using electron beam nanolithography and electroplating, arrays of Ni pillars on silicon that have a uniform diameter of 35 nm, a height of 120 nm, and a period of 100 nm were fabricated. The density of the pillar arrays is 65 Gbits/in.2—over two or
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28bb1edf8315dc1f87646dc2ac557102
https://doi.org/10.1063/1.358164
https://doi.org/10.1063/1.358164
Publikováno v:
1996 54th Annual Device Research Conference Digest.
The key obstacle that prevents many nanostructures and nanodevices from becoming economically viable is the lack of a high-throughput and low-cost nanolithography method. Recently, a high-throughput and low-cost nanolithography method, imprint lithog
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82a893129199a373af6a189cecc4e3b3
https://doi.org/10.1109/drc.1996.546433
https://doi.org/10.1109/drc.1996.546433
Autor:
Stephen Y. Chou, Peter R. Krauss
Publikováno v:
1997 55th Annual Device Research Conference Digest.
Nanoimprint lithography (NIL) is a new lithography paradigm that is based on deformation of a resist by compression molding rather than altering its chemical structure by radiation, and is designed to fabricate nanostructures inexpensively with high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::372d9f2cce5571e737d068f34eb58a8f
https://doi.org/10.1109/drc.1997.612486
https://doi.org/10.1109/drc.1997.612486