Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Peter Pirogovsky"'
Autor:
Peter Pirogovsky, Sophie Lantsberg, Tifha Horne, Ekaterina Tiktinsky, Sergey Domchic, Svetlana Agranovich
Publikováno v:
Clinical Nuclear Medicine. 34:76-78
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8e83d1bdf2f020456c773b75379049fb
https://doi.org/10.1097/rlu.0b013e318192c510
https://doi.org/10.1097/rlu.0b013e318192c510
Publikováno v:
SPIE Proceedings.
Advanced semiconductor logic devices are increasingly complex, typically composed of multiple layers of dielectric, metal, and semiconductor materials. Laser micromachining is employed on these devices to form cut-outs, microvias, and perform partial
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5d27c33b5e4a2f4f07f3dba430cfdc99
https://doi.org/10.1117/12.772111
https://doi.org/10.1117/12.772111
Autor:
Mike Bohan, M. Duane, Paul C. Allen, Peter Pirogovsky, Eric R. Christenson, Malik K. Sadiq, Sam C. Howells, Boaz Kenan, Michael White, Robin Teitzel, H. Dai, Henry Chris Hamaker
Publikováno v:
SPIE Proceedings.
The capability and performance of the production-proven DUV ALTA 4300 system has been extended by the development of two new optical subsystems: a 0.9 NA, 42X reduction lens and a high-bandwidth acousto-optic deflector based beam position and intensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::06ca1a304ad2952e100a66a6f85bcc76
https://doi.org/10.1117/12.637280
https://doi.org/10.1117/12.637280
Autor:
Peter Pirogovsky, Asher Klatchko
Publikováno v:
SPIE Proceedings.
We show that a conformal mapping of the type, W = z π/α, describes how a shape of a 45° rotated cross transforms into a contact hole. We discuss its relevance to corner rounding seen on raster beam pattern generators.© (2004) COPYRIGHT SPIE--The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::593e117c3f96d03326fdbcd6ac576e2f
https://doi.org/10.1117/12.561106
https://doi.org/10.1117/12.561106
Autor:
H. Christopher Hamaker, Robert Kiefer, Michael E. Ungureit, Boaz Kenan, Alan J. Wickstrom, Sam C. Howells, Michael Bohan, Curt Jackson, Eric R. Christenson, Malik K. Sadiq, Peter Pirogovsky, Paul C. Allen, Robin Teitzel, Michael White
Publikováno v:
SPIE Proceedings.
The capability of the DUV ALTAO 4300 system has been extended by the development of two new optical subsystems: a 0.9 NA, 42X reduction lens and a high-bandwidth acousto-optic deflector based beam position and intensity correction servo. The PSM over
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5091775115dc2dd91594577b4fbe8093
https://doi.org/10.1117/12.570291
https://doi.org/10.1117/12.570291
Autor:
Asher Klatchko, Samuel C. Howells, B. Skyborg, Michael E. Ungureit, Michael White, Thomas E. Chabreck, Robin Teitzel, Peter Pirogovsky, Cris Morgante, John Hubbard, Paul C. Allen, Andrew Berwick
Publikováno v:
SPIE Proceedings.
The ALTA 4300 system has been used to successfully write many advanced designs previously only possible with 50kV VSB systems. In order to further enlarge the application space of this high productivity system, an aerial image enhancement technique h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a644ebb3d9c477ae88903e3deebf46c
https://doi.org/10.1117/12.557806
https://doi.org/10.1117/12.557806
Autor:
Peter Pirogovsky, Asher Klatchko, Boaz Kenan, Paul C. Allen, Alex Buxbaum, Samuel C. Howells, Michael White, Robin Teitzel
Publikováno v:
SPIE Proceedings.
The ALTA 4300 system has been used to successfully write many advanced design layers previously only feasible with 50kV vector shaped beam tools. In order to further enlarge the application space of this high productivity an aerial image enhancement
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d226d4b47f1da61e3ba2db6dc11499c
https://doi.org/10.1117/12.518218
https://doi.org/10.1117/12.518218
Autor:
Dennis R. McKean, Benjamen M. Rathsack, Peter Pirogovsky, Jeff A. Albelo, Timothy B. Stachowiak, David R. Medeiros, Kathleen Lou, C. Grant Willson, Cyrus Emil Tabery, Peter I. Tattersall
Publikováno v:
SPIE Proceedings.
Photoactive compounds have been designed, synthesized and characterized for deep ultraviolet non-chemically amplified resist applications. These resist materials may have potential use in next generation 257nm mask fabrication. Mask fabrication requi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::822c61e0b1d9da722ba4ed38c22f6ebc
https://doi.org/10.1117/12.436887
https://doi.org/10.1117/12.436887
Publikováno v:
SPIE Proceedings.
Consumer demand for faster computers, increased data storage space, and higher density memory arrays has driven development efforts in photomask production the way of the wafer fab. This drive has pushed mask fabrication toward smaller and more unifo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d0b3b073d78d81a2da1ceece481de312
https://doi.org/10.1117/12.410734
https://doi.org/10.1117/12.410734
Autor:
Asher Klatchko, Peter Pirogovsky
Publikováno v:
Journal of Applied Physics. 98:084504
It is shown that patterning with a Gaussian beam on thin films is congruent to a diffusion process. In particular, the acuity of the image patterned is tied to a steady state (Laplace equation). For a small spot size, pattern acuity improves locally
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac1b367d4e12ccf482ee690827564051
https://doi.org/10.1063/1.2085310
https://doi.org/10.1063/1.2085310