Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Peter Krabbendam"'
Autor:
Jan van Schoot, Kars Zeger Troost, Sascha Migura, Tilmann Heil, Jos Benschop, Hans Meiling, Sjoerd Lok, Jo Finders, Peter Krabbendam, Rob van Ballegoij, Judon Stoeldraijer, Eelco van Setten, Peter Kuerz, Bernhard Kneer, Winfried Kaiser, Frank Bornebroek
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX
While 0.33NA EUV systems are readying to start volume manufacturing, ASML and Zeiss are ramping up development activities on a 0.55NA EUV exposure tool, extending Moore’s law throughout the next decade. A novel, anamorphic lens design, has been dev
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2f1710a4c3afccd08db4fa6c7e3287a5
https://doi.org/10.1117/12.2295800
https://doi.org/10.1117/12.2295800
Autor:
Frank Bornebroek, Judon Stoeldraijer, Hans Meiling, Peter Kuerz, Jens Timo Neumann, Sjoerd Lok, Erik Roelof Loopstra, Kars Zeger Troost, Eelco van Setten, Jos Benschop, Tilmann Heil, Jo Finders, Peter Krabbendam, Winfried Kaiser, Rob van Ballegoij, Bernhard Kneer, Jan van Schoot, Sascha Migura
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2017
While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their activities on a EUV exposure tool with Numerical Aperture of 0.55. The purpose of this scanner, targeting
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3946d6d4bf434ebc5587638befd007ce
Autor:
Uwe Stamm, Jo Finders, Jan van Schoot, Jos Benschop, Eelco van Setten, Judon Stoeldraijer, Sascha Migura, Winfried Kaiser, Bernd Thuering, Niclas Mika, Peter Krabbendam, Bernhard Kneer, Tilmann Heil, Kars Zeger Troost, Rob van Ballegoij, Erik Roelof Loopstra, Jeannot Dredonx, Hans Meiling, Alberto Pirati
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII
While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their development activities on a EUV exposure tool with Numerical Aperture greater than 0.5. The purpose of th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::68a7dec32f2aad60f2519b66c46f6ca0