Estimating resist parameters in optical lithography using the extended Nijboer-Zernike theory

Autor: Peter Dirksen, Joseph J. M. Braat, Augustus J. E. M. Janssen

Publikováno v: Journal of Microlithography, Microfabrication and Microsystems, 5(1), 013005-1/11. SPIE
Journal of microlithography, microfabrication, and microsystems, 5.2006, nr.1

This study presents an experimental method to determine the resist parameters at the origin of a general blurring of a projected aerial image. The resist model includes the effects of diffusion in the horizontal plane and image blur that originates f

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::95c1176690e59c7d272592984725e001
https://research.tue.nl/en/publications/dbce72fc-77bb-4a9a-9a1f-da2b33d96181

Experimental determination of lens aberrations from the intensity point-spread function in the focal region

Autor: Peter Dirksen, Augustus J. E. M. Janssen, Casper A. H. Juffermans, Ad Leeuwestein, Joseph J. M. Braat

Publikováno v: Proceedings Optical Microlithography XVI, 25-28 February 2003, Santa Clara, California, 1-10
STARTPAGE=1;ENDPAGE=10;TITLE=Proceedings Optical Microlithography XVI, 25-28 February 2003, Santa Clara, California

In this paper we show various results of aberration retrieval using the pinhole method in conjunction with the extended Nijboer-Zernike theory. The experiments are performed on modern wafer scanners. Keyboard commanded offsets of the movable lens ele

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f2552cc662a14792d520e23c211f1b4c
https://doi.org/10.1117/12.485388

Characterization of a projection lens using the extended Nijboer-Zernike approach

Autor: Joseph J. M. Braat, Casper A. H. Juffermans, Alvina M. Williams, Peter Dirksen, Peter De Bisschop, Guido C.A.M. Janssen

Publikováno v: Proceedings Optical Microlithography XV, 5-8 March 2002, Santa Clara, California, 1392-1399
STARTPAGE=1392;ENDPAGE=1399;TITLE=Proceedings Optical Microlithography XV, 5-8 March 2002, Santa Clara, California

In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyse and i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b04556f67b139eca8737b9d5bb272122
https://doi.org/10.1117/12.474523

Chapter 6 Assessment of optical systems by means of point-spread functions

Autor: J.J.M. Braat, Ajem Guido Janssen, Peter Dirksen, S van Haver

Publisher Summary This chapter presents the computation of the point-spread function of optical imaging systems and the characterization of these systems by means of the measured three-dimensional structure of the point-spread function. The point-spr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d366259a7f0aef300ff73784010db4dd
https://doi.org/10.1016/s0079-6638(07)51006-1

Energy and momentum flux in a high-numerical-aperture beam using the extended Nijboer-Zernike diffraction formalism

Autor: Peter Dirksen, Augustus J. E. M. Janssen, S van Haver, J.J.M. Braat

Publikováno v: Journal of the European Optical Society: Rapid Publications. 2

We describe the energy and momentum flux in the case of an aberrated optical imaging system with a high numerical aperture (NA). The approach is based on the extended Nijboer-Zernike diffraction theory, that, in its high-NA version, yields an accurat

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b562bb7eec076f645fc6db67a4585acc
https://doi.org/10.2971/jeos.2007.07032