Zobrazeno 1 - 10
of 29
pro vyhledávání: '"Pengpeng Yuan"'
Autor:
Wenzhuo Zhao, Pengpeng Yuan, Qi Zhang, Nan Liu, Yulai Wang, Peng Wang, Thomas Huhn, Zhongduo Yang, Tiankun Zhao
Publikováno v:
Results in Chemistry, Vol 6, Iss , Pp 101161- (2023)
A novel dimeric phenolato Hafnium complex [{HfIV(Salan2,4-Me)(OnBu)}2O] was synthesized by reacting [HfIV(Salan2,4-Me)2] in the presence of 100 equiv. of H2O. The structure was characterized by 1H, 13C NMR spectroscopy, HRMS and X-Ray diffraction. In
Externí odkaz:
https://doaj.org/article/ebad4fccce004a81af1879801a834c25
Publikováno v:
Geo-spatial Information Science, Vol 25, Iss 4, Pp 588-599 (2022)
ABSTRACTThe subsurface of urban cities is becoming increasingly congested. In-time records of subsurface structures are of vital importance for the maintenance and management of urban infrastructure beneath or above the ground. Ground-penetrating rad
Externí odkaz:
https://doaj.org/article/65172512f5444a51a732043453476443
Publikováno v:
Journal of Microelectronic Manufacturing, Vol 3, Iss 4 (2020)
The shrinking of the size of the advanced technological nodes brings up new challenges to the semiconductor manufacturing community. The optical proximity correction (OPC) is invented to reduce the errors of the lithographic process. The conventional
Externí odkaz:
https://doaj.org/article/bb3991776e8e408a98ad62f1b19edb2b
Autor:
Thomas Huhn, Tiankun Zhao, Peng Wang, Xupeng Zhang, Nan Liu, Wenzhuo Zhao, Yong Zhang, Pengpeng Yuan, Shanjia Li, Mingjun Yang, Zhongduo Yang
Publikováno v:
Current Topics in Medicinal Chemistry. 23
Abstract: Titanocene dichloride and budotitane have opened a new chapter in medicinal chemistry of titanium(IV) complexes being novel non-platinum antitumor metallic agents. Numerous efforts have led to the discovery of the diamino bis-phenolato tita
Publikováno v:
DTCO and Computational Patterning II.
Publikováno v:
Applied optics. 61(14)
The miniaturization of nodes poses new challenges in semiconductor manufacturing. Optical proximity correction (OPC) is typically performed to satisfy technical requirements through iterative optimization. However, this method is expensive and slow.
Publikováno v:
Annals of Operations Research.
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 20
The mask 3D effect is important even for deep ultraviolet lithography. After the wavelength becomes shorter in extreme ultraviolet (EUV) regime, it becomes even more important. We also need to consider the asymmetric effect as well as the shadow effe
Publikováno v:
2021 China Semiconductor Technology International Conference (CSTIC).
This paper discuss a simple deep neural network which aimed to finish the simulation of the lithographic process. It can be finalized by a more comprehensive model formed by combined networks each for different parts of lithographic process. The adva
Autor:
Dongdong Gu, Pengpeng Yuan
Publikováno v:
Journal of Applied Physics; 2015, Vol. 118 Issue 23, p233109-1-233109-10, 10p, 6 Diagrams, 2 Charts, 4 Graphs