Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Peiter van de Wel"'
Autor:
Max C. Schürmann, Peter Zink, Günther Derra, Erik Wagenaars, Marc Corthout, Hans Scheuermann, Guido Schriever, Jeroen Jonkers, Rolf Apetz, Guido Seimons, Marcel Damen, Peiter van de Wel, Rob Snijkers, Jesko Dr. Brudermann, Jürgen Klein, Masaki Yoshioka, Willi Neff, Oliver Franken, Oliver Zitzen, Dominik Marcel Vaudrevange, Felix Küpper, Arnaud Mader
Publikováno v:
SPIE Proceedings.
For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d8e8a04b4a2de39e064683cab332b4a
https://doi.org/10.1117/12.772633
https://doi.org/10.1117/12.772633
