Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Pei Sin Jhu"'
Publikováno v:
Applied Mechanics and Materials. :80-85
Atomic layer deposition (ALD) is utilized to grow high performance aluminum oxide (Al2O3) barrier films on flexible PET substrates, where the effects of precursor pulse time and deposition temperature on the film properties are also studied in this w
Publikováno v:
Advanced Materials Research. 650:18-23
Atomic layer deposition (ALD) is utilized to grow high performance zinc oxide (ZnO) thin films, where the effects of ALD process temperature on the thin film properties are also studied in this work. Some major properties of the ALD ZnO films are cha
Publikováno v:
MATEC Web of Conferences, Vol 71, p 04001 (2016)
Various encapsulated films for flexible organic light emitting diodes (OLEDs) were studied in this work, where gas barrier layers including inorganic Al2O3 thin films prepared by atomic layer deposition, organic Parylene C thin films prepared by chem
Publikováno v:
MATEC Web of Conferences; 8/3/2016, Vol. 71, p1-4, 4p
Publikováno v:
Sensors & Materials; 2016, Vol. 28 Issue 9, p983-990, 8p