Novel phosphate-functionalized silica-based dispersions for selectively polishing silicon nitride over silicon dioxide and polysilicon films.

Autor: Veera Dandu PR; Department of Chemical and Biomolecular Engineering and Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13676, USA., Penta NK, Peethala BC, Babu SV

Publikováno v: Journal of colloid and interface science [J Colloid Interface Sci] 2010 Aug 01; Vol. 348 (1), pp. 114-8. Date of Electronic Publication: 2010 Apr 18.