Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Paul van der Vleuten"'
Autor:
Paul van der Vleuten, Arjan Verhappen, Martin Chaplin, Lloyd C. Litt, Jan Pieter Kuijten, Stephan van der Goor, Will Conley, Bryan S. Kasprowicz
Publikováno v:
Microelectronic Engineering. 84:1019-1022
This paper will focus on the process impact of the intentional change in the mask writing grid. Grids ranging from 1nm to 4nm (defined at mask level) were used to investigate the effect on test structures in critical locations. The impact on optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7f64c149d420a1a9f9ae5ccf944dc9a4
https://doi.org/10.1016/j.mee.2007.01.140
https://doi.org/10.1016/j.mee.2007.01.140
Autor:
Stephan van der Goor, Martin Chaplin, Arjan Verhappen, Lloyd C. Litt, Will Conley, Paul van der Vleuten, Jan Pieter Kuijten, Bryan S. Kasprowicz
Publikováno v:
Microelectronic Engineering. 84:746-749
A study has been completed to investigate the imaging performance with the industry standard 6% attenuated phase shift mask. Several test structures were used to investigate the effects on line edge roughness (LER) based on the polarization state of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e010efbd5e3b925e3a0e3421403836cc
https://doi.org/10.1016/j.mee.2007.01.126
https://doi.org/10.1016/j.mee.2007.01.126