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Publikováno v:
2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference & Workshop (IEEE Cat. No.04CH37530); 2004, p227-231, 5p
Publikováno v:
2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530).
This paper discusses about the effectiveness of advanced e-beam inspection. Using an e-beam inspection system, the eS20XP (SN 158) from KLA-Tencor Corporation, DRAM development and ramp-up was accelerated. This was accomplished by analyzing the yield
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1daf2b3d32a80824d7765c63674c3cad
https://doi.org/10.1109/asmc.2004.1309571
https://doi.org/10.1109/asmc.2004.1309571