List of Contributors

Autor: Rafik Addou, Arto Aho, Aaron M. Andrews, Richardella Anthony, Donat J. As, Vitaliy Avrutin, Gavin R. Bell, Sergio Bietti, Victor Blinov, Andrea Castellano, Laurent Cerutti, Kevin Clark, Charles Cornet, Mickaël Da Silva, Phillip Dang, Hermann Detz, Molly Doran, Olivier Durand, Stephen Farrell, I.A. Fischer, Everett Fraser, Alex Freundlich, Alexandre Garreau, Mircea Guina, Teemu Hakkarainen, Drew Hanser, Isaac Hernández-Calderón, Christopher L. Hinkle, Yoshiji Horikosh, Alex Ignatiev, Sergey V. Ivanov, Roland Jäger, Valentin N. Jmerik, Shane R. Johnson, Yung-Chung Kao, Nobuyuki Koguchi, Xufeng Kou, Jenn-Ming Kuo, Naohiro Kuze, François Lelarge, Christophe Levallois, Juan Li, Wei Li, Klaus Lischka, Joao Marcelo Jordao Lopes, Donald MacFarland, Karine Madiomanana, Matthew Marek, Zetian Mi, Hadis Morkoç, Maksym Myronov, Grégoire Narcy, Dmitrii V. Nechaev, Tianxiao Nie, Alexander Nikiforov, Jiro Nishinaga, Samarth Nitin, Gang Niu, Kunishige Oe, M. Oehme, Mark O’Steen, Ümit Özgür, Oleg Pchelyakov, Paul Pinsukanjana, Dmitry Pridachin, Eric Readinger, Jean-Baptiste Rodriguez, Guillaume Saint-Girons, Stefano Sanguinetti, Stephen T. Schaefer, Achim Schöll, Andreas Schramm, Frank Schreiber, Werner Schrenk, J. Schulze, Irina V. Sedova, Arvind J. Shalindar, Aidong Shen, Ichiro Shibasaki, Leonid Sokolov, Sergey V. Sorokin, Gunther Springholz, Gottfried Strasser, Jianshi Tang, Eric Tournié, Kevin Vargason, Dominique Vignaud, Jukka Viheriälä, Bertrand Vilquin, Suresh Vishwanath, Robert M. Wallace, Lee A. Walsh, Kang L. Wang, Shu M. Wang, Preston T. Webster, Huili G. Xing, Faxian Xiu, Masahiro Yoshimoto, Tobias Zederbauer, Songrui Zhao

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::906b622bf9aa2dc954e18d9ee0b85c6b
https://doi.org/10.1016/b978-0-12-812136-8.00049-9

InGaAs composition monitoring for production MBE by in situ optical-based flux monitor (OFM)

Autor: Mehul A. Trivedi, Roger F. Dickey, Paul Pinsukanjana, Jared Hubbard, Yung-Chung Kao, Philip S. Kao, J. Marquis, Sam P. Kuo, Jerry M.-S. Tsai

Publikováno v: Journal of Crystal Growth. 251:124-129

Atomic absorption optical-based flux monitor (OFM) has been implemented as a non-invasive in situ measurement tool for production MBE operation. For our setup, the optical probe beam samples the group III beam fluxes (Al, Ga, and In) by passing just

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2f6cd2140da9c388dadb9497762a139f
https://doi.org/10.1016/s0022-0248(02)02293-5

Monitoring Ga and In desorption and In surface segregation during MBE using atomic absorption

Autor: Paul Pinsukanjana, Andrew W. Jackson, Larry A. Coldren, Arthur C. Gossard

Publikováno v: Journal of Crystal Growth. :244-249

The use of an atomic absorption flux monitor for measuring desorbing gallium and indium atoms during MBE is demonstrated. Several short InAs layers of known thickness were grown on a GaAs substrate. By desorbing these layers in a controlled substrate

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::659e1f2d638831e4f29afbb189d1d7df
https://doi.org/10.1016/s0022-0248(96)01232-8

Real-time simultaneous optical-based flux monitoring of Al, Ga, and In using atomic absorption for molecular beam epitaxy

Autor: Jan Arild Tofte, K. D. Maranowski, Arthur C. Gossard, Paul Pinsukanjana, Andrew W. Jackson, Scott A. Chalmers, Scott Campbell, Larry A. Coldren, John H. English

Publikováno v: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:2147

We have developed a multichannel atomic absorption measurement system for real‐time simultaneous monitoring of Al, Ga, and In molecular beam fluxes. In our configuration, distinct atomic emission lines from three hollow cathode lamps are combined i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6d653e3958e2a15fe021510ebb151b73
https://doi.org/10.1116/1.588887