Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Paul Karakatsanis"'
Autor:
Helene Casalta, Andreas Hirsch, Xavier Camps, Otto Vostrowsky, Thomas M. Bayerl, Michael Hetzer, Paul Karakatsanis
Publikováno v:
The Journal of Physical Chemistry A. 104:5437-5443
Lipo-fullerenes are lipophilic C60 derivatives (six pairs of alkyl chains symmetrically grafted to the C60 cage) that intercalate in phospholipid bilayers by the formation of rodlike structures of nanoscopic dimensions. Proton NMR measurements in the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::956cd24616961f53cd494efe05105e20
https://doi.org/10.1021/jp0000634
https://doi.org/10.1021/jp0000634
Autor:
Thomas M. Bayerl, Paul Karakatsanis
Publikováno v:
Physical Review E. 54:1785-1790
For the first time, to our knowledge, self-diffusion of lipids and water in lipid bilayers is studied by proton NMR measurements in the fringe field of a superconducting magnet. Highly oriented multilayer stacks of dipalmitoyl phosphatidylcholine wer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::82ceefe24599381a624d661f4919ab37
https://doi.org/10.1103/physreve.54.1785
https://doi.org/10.1103/physreve.54.1785
Autor:
Ian Stobert, Vyacheslav Rovner, Tejas Jhaveri, Paul Karakatsanis, Lars W. Liebmann, Andrzej J. Strojwas, Larry Pileggi
Publikováno v:
SPIE Proceedings.
Cost and complexity associated with OPC and masks are rapidly increasing to the point that they could limit technology scaling in the future. This paper focuses on demonstrating the advantages of regular design fabrics for OPC simplification to enabl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f09d0a939067ef18e159bcd24f15ca90
https://doi.org/10.1117/12.814406
https://doi.org/10.1117/12.814406
Publikováno v:
SPIE Proceedings.
We present a new method of sidelobe suppressor placement based on fast lithographic simulation. Experimental results of printing 0.18 micron contact holes using a 5.5 percent transmittance attenuated phase shift mask with different settings of partia
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2da6580e8cead933dbc2f44d88b6f724
https://doi.org/10.1117/12.388952
https://doi.org/10.1117/12.388952
Publikováno v:
SPIE Proceedings.
The paper describes the extension of optical proximity correction (OPC), which is well established for conventional chromium-on-glass mask printing, to alternating phase shift masks (altPSM). Aerial image simulation of various situations of light-fie
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1ce4ef86e36497fdb06fbb53bdf3edb7
https://doi.org/10.1117/12.354367
https://doi.org/10.1117/12.354367
Publikováno v:
SPIE Proceedings.
The pattern transfer process from the chip layout data to the structures on the finished wafer consists of many process steps. Although desired, none of these steps is linear in all aspects of the pattern transfer. Approaching the process limits due
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c59ca21c51099f1da1c0b8778917d1c3
https://doi.org/10.1117/12.310754
https://doi.org/10.1117/12.310754
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Conference
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