Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Paul Gutwin"'
Publikováno v:
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
New tools and methodologies are fused with conventional elements of the process-design-kit (PDK) and design enablement to introduce a rigorous yet fast and agile technology prototyping platform. This design technology cooptimization (DTCO) solution r
Publikováno v:
SPIE Proceedings.
As pitch scaling is becoming constrained not only by lithographic resolution limits but alos by fundamental device and interconnect challenges the semiconductor industry has turned to cell-height reduction as a means of achieving competitive area sca
Publikováno v:
SPIE Proceedings.
This paper reviews the most critical components of a ‘holistic’ DTCO flow for an advanced technology node and in doing so quantifies the differences between 7nm technology node definitions implemented with extreme ultraviolet and 193nm immersion
Publikováno v:
SPIE Proceedings.
This paper reviews the escalation in design constraints imposed on 2 nd level wiring by multiple patterning exposure techniques in the 10NM technology node (i.e. ~45nm wiring pitch) relative to the 14NM technology node (i.e. 64nm wiring pitch). Speci
Publikováno v:
Proceedings of the 34th Design Automation Conference; 1997, pi-xxvix, 1p
Autor:
Patrick C. McGeer, Robert K. Brayton
This book is an extension of one author's doctoral thesis on the false path problem. The work was begun with the idea of systematizing the various solutions to the false path problem that had been proposed in the literature, with a view to determinin