Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Paul D. H. Chung"'
Autor:
Jinsang Yoon, In-Kyun Shin, Han-Shin Lee, Heung-Suk Oh, Chan-Uk Jeon, Hyo-Yeon Kim, Paul D. H. Chung, Jaehyuck Choi
Publikováno v:
SPIE Proceedings.
Spin cleaning tools have advantages in cross contamination compared to bath cleaning tools. Although spin speed is one of key parameters to increase the cleaning efficiency of the spin cleaning tools, its optimization has been limited due to the gene
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::60b586116c4e18a139b848800e131b7e
https://doi.org/10.1117/12.979820
https://doi.org/10.1117/12.979820
Autor:
Paul D. H. Chung, Cecilia Montgomery, Takeya Shimomura, Jaehyuck Choi, Frank Goodwin, Andy Ma, Han-Ku Cho, In-Kyun Shin, Jinsang Yoon, Alex Friz, Dae-hyuk Kang, Han-Shin Lee
Publikováno v:
SPIE Proceedings.
EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22c9753e4398c9be443fd5a5ba7b555d
https://doi.org/10.1117/12.896836
https://doi.org/10.1117/12.896836
Autor:
Vikram Tolani, Han-Ku Cho, Tom Cecil, Linyong Pang, Danping Peng, Ki-Ho Baik, Paul D. H. Chung, Chan-Uk Jeon, David Kim, Jinhyung Park
Publikováno v:
SPIE Proceedings.
At the most advanced technology nodes, such as 32nm and 22nm, aggressive OPC and Sub-Resolution Assist Features (SRAFs) are required. However, their use results in significantly increased mask complexity, making mask defect disposition more challengi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7cd0e0829147b2613b74e7cab4a6fa0f
https://doi.org/10.1117/12.830034
https://doi.org/10.1117/12.830034