Zobrazeno 1 - 7 of 7 pro vyhledávání: '"Paul Colsters"'
1
SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Autor: Joost Bekaert, Vadim Timoshkov, Friso Wittebrood, Ming Mao, Stefan Decoster, Philippe Leray, Bogumila Kutrzeba Kotowska, Paul Colsters, Mark John Maslow, Greg McIntyre, Joern-Holger Franke, Emily Gallagher, Frederic Lazzarino, Ton Kiers, Stephane Lariviere, Paolo Di Lorenzo, Victor M. Blanco Carballo, Eric Hendrickx, Joep van Dijk, R. Ryoung-han Kim
Publikováno v: SPIE Proceedings.
The imec N7 (iN7) platform has been developed to evaluate EUV patterning of advanced logic BEOL layers. Its design is based on a 42 nm first-level metal (M1) pitch, and a 32 nm pitch for the subsequent M2 layer. With these pitches, the iN7 node is an
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7bf8c19cbc1b652c29e7864d5b0690a8
https://doi.org/10.1117/12.2258004
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2
NXE pellicle: development update
Autor: Andrea Lodovico Mancuso, Hilary Harrold, Ronald Harm Gunther Kramer, Daniel Smith, David Ockwell, Eric Casimiri, Paul Colsters, Piet Hennus, Paul Janssen, James N. Wiley, Dennis De Graaf, Derk Brouns, David van de Weg, Henk Kuntzel, Par Broman, Raymond Wilhelmus Louis Lafarre, Aage Bendiksen, Matthias Kruizinga
Publikováno v: SPIE Proceedings.
ASML introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future patterned mask inspection methods. We will present results of how we have taken the idea from concept to a demonstrated solution enabli
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b85ede2a497f8be3353eeca2c1938e4b
https://doi.org/10.1117/12.2239882
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3
NXE pellicle: offering a EUV pellicle solution to the industry
Autor: Beatrijs Louise Marie-Joseph Katrien Verbrugge, Henk Kuntzel, Ronald Harm Gunther Kramer, Pieter Jan van Zwol, Derk Brouns, David Ockwell, Par Broman, Eric Casimiri, Dennis De Graaf, David van de Weg, Carmen Zoldesi, Aage Bendiksen, Paul Janssen, Paul Colsters, Peter A. Delmastro, Daniel Smith, Noelie Wojewoda, Matthias Kruizinga, Mark van de Kerkhof, James N. Wiley, Maria Peter, Frits Van Der Meulen
Publikováno v: Extreme Ultraviolet (EUV) Lithography VII
Towards the end of 2014, ASML committed to provide a EUV pellicle solution to the industry. Last year, during SPIE Microlithography 2015, we introduced the NXE pellicle concept, a removable pellicle solution that is compatible with current and future
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7ad8815ec58e65e3961469eed4a1f480
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4
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Autor: J. van Dijk, A. Van Dijk, K. Ricken, John McNamara, Vidya Vaenkatesan, Paul Colsters, W. Liebregts, Rik Hoefnagels, J. Hageman, Guido Schiffelers, R. Pellens, L. de Winter, Rik Jonckheere, R. de Kruif, Natalia Davydova, Thijs Hollink, E. van Setten, R. Kottumakulal
Publikováno v: SPIE Proceedings.
EUV sources emit a broad band DUV Out-of-Band (OOB) light, in particular, in the wavelength range 100-400 nm. This can cause additional exposure of EUV resists made that are based on a ArF/KrF resist platform. This DUV light is partially suppressed w
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::144bf2c2d00f9035fd4580b36870516c
https://doi.org/10.1117/12.2195733
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5
Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra
Autor: van de Mcm Richard Sanden, Rah Richard Engeln, Terje Tar Hansen, Pgj Paul Colsters
Publikováno v: Journal of Physics D: Applied Physics, 44(35):355205, 355205-1/11. Institute of Physics
Journal of Physics D-Applied Physics, 44, 355205
Journal of Physics D: Applied Physics
Journal of Physics D: Applied Physics, IOP Publishing, 2011, 44 (35), pp.355205. ⟨10.1088/0022-3727/44/35/355205⟩
International audience; The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbon and graphite etching are investigated via time and spatially resolved measurements of the ion density and CH emission. A con
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5ff0449088c9135f690512e8d032f9d1
https://research.tue.nl/nl/publications/e449c29b-6749-4c1e-a10a-c31949d622d3
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6
Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon
Autor: van de Mcm Richard Sanden, Terje Tar Hansen, Rah Richard Engeln, JW Jan-Willem Weber, Dmhg Mestrom, Pgj Paul Colsters
Publikováno v: Journal of Applied Physics, 112(1):013302, 013302-1/12. American Institute of Physics
The etch mechanisms of hydrogenated amorphous carbon thin films in low-energetic (
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9aea9de6bdedf6859d8dc5687ea61d66
https://doi.org/10.1063/1.4730924
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7
Two-dimensional flow characteristic of a hot expanding plasma
Autor: Pgj Paul Colsters, Onno Gabriel, Rah Richard Engeln, DC Daan Schram
Publikováno v: Plasma Sources Science and Technology, 17(1), 015011-1/8. Institute of Physics
A hot argon plasma expansion into a low-pressure background is investigated by means of laser induced fluorescence on argon metastables. The result is a complete two-dimensional flow field of the expanding system that covers the area reaching from th
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::31aad02e6a0c8456e6cbec1958f15b42
https://doi.org/10.1088/0963-0252/17/1/015011
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