Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Paul Chiang"'
Pharmacist medication review: An integrated team approach to serve home-based primary care patients.
Publikováno v:
PLoS ONE, Vol 16, Iss 5, p e0252151 (2021)
BackgroundComprehensive medication review is a patient-centered approach to optimize medication use and improve patient outcomes. This study outlines a pilot model of care in which a remote corporate-based clinical pharmacist implemented comprehensiv
Externí odkaz:
https://doaj.org/article/0d0274ff5e3d4c968cef3156e9033115
Publikováno v:
PLoS ONE
PLoS ONE, Vol 16, Iss 5, p e0252151 (2021)
PLoS ONE, Vol 16, Iss 5, p e0252151 (2021)
Background Comprehensive medication review is a patient-centered approach to optimize medication use and improve patient outcomes. This study outlines a pilot model of care in which a remote corporate-based clinical pharmacist implemented comprehensi
Autor:
Shang-Wei Chou, Chin-Cheng Paul Chiang, Yun Chi, Ya-Yun Yang, Kum-Yi Cheng, Pi-Tai Chou, Ting-Kuang Chang, Hung-Lung Chou, Pei-Jen Chang, Ching-Yen Lin, Jing-Jong Shyue, Chang-Yu Hung
Publikováno v:
Advanced Functional Materials. 28:1870020
Autor:
Kum-Yi Cheng, Hung-Lung Chou, Shang-Wei Chou, Chang-Yu Hung, Ya-Yun Yang, Jing-Jong Shyue, Pi-Tai Chou, Pei-Jen Chang, Yun Chi, Chin-Cheng Paul Chiang, Ting-Kuang Chang, Ching-Yen Lin
Publikováno v:
Advanced Functional Materials. 28:1703282
PtCoFe nanowires with different alloying compositions are chemically prepared and acted as counter electrodes (CEs) in dye-sensitized solar cells (DSSCs) with Ru(II)-based dyes. Due to their superior I3− reduction activity, PtCoFe nanowires with ri
Autor:
Sean Riley, Paul Chiang
Publikováno v:
Real-Time Image Processing
The demand on digital signal processing has been growing continuously driven by the increased data array size and sophisticated algorithms. The existing solutions using FPGA and/or ASIC have its advantages and drawbacks. The newly developed FPOA tech
Autor:
Shu Ping Fang, Paul Chiang, Hsiang Yang, Benjamin Sue-Min Lin, Kuei-Chun Hung, Hsien-an Chang
Publikováno v:
Optical Microlithography XVIII.
Optical resolution limit is one of the concerns for exposure tool selection. ArF lithography tools are the first choice for critical layers of 90 nm node with pitches narrower than 280 nm. However, high cost of ArF tools and photoresists make IC manu
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