Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Paul C. Allen"'
Autor:
H. Christopher Hamaker, Paul C. Allen
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020.
Laser mask pattern generators (MPGs) write the majority today’s masks. They are the tools of choice for the application spaces of legacy-node chip production and second-level writing for advanced masks. Increasingly, they are also being used to pri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::702866e9246c0a6361f72d957013aecf
https://doi.org/10.1117/12.2551944
https://doi.org/10.1117/12.2551944
Autor:
Ofir Gan, Brid Connolly, Massimiliano Pindo, Assia Barkai, Paul C. Allen, Harel Frish, Peter Buck
Publikováno v:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V.
In this paper we present a 45-degree mirror created for optical applications utilizing CMOS high-volume manufacturing processes with a gray-scale lithography technique. The process that is presented here was done by creating a 3D pattern in the photo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9f352f5b36741cc7407a1ace92bcae4
https://doi.org/10.1117/12.907275
https://doi.org/10.1117/12.907275
Autor:
Vishal Garg, Jason Hickethier, Cris Morgante, John Manfredo, Peter Buck, Curt Jackson, Paul C. Allen, Michael White, Robert Kiefer
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation Deep Ultra-Violet (DUV) Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f68b235c169aff6069230a917974dbf6
https://doi.org/10.1117/12.632227
https://doi.org/10.1117/12.632227
Autor:
Curt Jackson, Cris Morgante, Paul C. Allen, John Manfredo, Peter D. Buck, Robert Kiefer, Vishal Garg, David Mellenthin, Jason Hickethier, Michael White, Sarah Cohen, Eric R. Christenson
Publikováno v:
SPIE Proceedings.
Currently, the ALTA 4300 generation DUV Laser tool is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth data-path t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::609ac3c9363e404e611eb2ddf625b124
https://doi.org/10.1117/12.617524
https://doi.org/10.1117/12.617524
Autor:
Mike Bohan, M. Duane, Paul C. Allen, Peter Pirogovsky, Eric R. Christenson, Malik K. Sadiq, Sam C. Howells, Boaz Kenan, Michael White, Robin Teitzel, H. Dai, Henry Chris Hamaker
Publikováno v:
SPIE Proceedings.
The capability and performance of the production-proven DUV ALTA 4300 system has been extended by the development of two new optical subsystems: a 0.9 NA, 42X reduction lens and a high-bandwidth acousto-optic deflector based beam position and intensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::06ca1a304ad2952e100a66a6f85bcc76
https://doi.org/10.1117/12.637280
https://doi.org/10.1117/12.637280
Autor:
Vishal Garg, Curt Jackson, John Manfredo, David Mellenthin, Cris Morgante, Sarah Cohen, Robert Kiefer, Michael White, Peter D. Buck, Paul C. Allen
Publikováno v:
Optical Microlithography XVIII.
Currently, the ALTA ® 4300 generation DUV Laser system is capable of printing critical and semi-critical photomasks for the 130nm and 90nm IC technology nodes. With improved optical elements, an improved objective lens, and a higher bandwidth datapa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1a162ef2a28b7cf8be92ba31ac92da5
https://doi.org/10.1117/12.600368
https://doi.org/10.1117/12.600368
Autor:
H. Christopher Hamaker, Robert Kiefer, Michael E. Ungureit, Boaz Kenan, Alan J. Wickstrom, Sam C. Howells, Michael Bohan, Curt Jackson, Eric R. Christenson, Malik K. Sadiq, Peter Pirogovsky, Paul C. Allen, Robin Teitzel, Michael White
Publikováno v:
SPIE Proceedings.
The capability of the DUV ALTAO 4300 system has been extended by the development of two new optical subsystems: a 0.9 NA, 42X reduction lens and a high-bandwidth acousto-optic deflector based beam position and intensity correction servo. The PSM over
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5091775115dc2dd91594577b4fbe8093
https://doi.org/10.1117/12.570291
https://doi.org/10.1117/12.570291
Autor:
Asher Klatchko, Samuel C. Howells, B. Skyborg, Michael E. Ungureit, Michael White, Thomas E. Chabreck, Robin Teitzel, Peter Pirogovsky, Cris Morgante, John Hubbard, Paul C. Allen, Andrew Berwick
Publikováno v:
SPIE Proceedings.
The ALTA 4300 system has been used to successfully write many advanced designs previously only possible with 50kV VSB systems. In order to further enlarge the application space of this high productivity system, an aerial image enhancement technique h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3a644ebb3d9c477ae88903e3deebf46c
https://doi.org/10.1117/12.557806
https://doi.org/10.1117/12.557806
Autor:
Peter Pirogovsky, Asher Klatchko, Boaz Kenan, Paul C. Allen, Alex Buxbaum, Samuel C. Howells, Michael White, Robin Teitzel
Publikováno v:
SPIE Proceedings.
The ALTA 4300 system has been used to successfully write many advanced design layers previously only feasible with 50kV vector shaped beam tools. In order to further enlarge the application space of this high productivity an aerial image enhancement
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1d226d4b47f1da61e3ba2db6dc11499c
https://doi.org/10.1117/12.518218
https://doi.org/10.1117/12.518218
Autor:
Paul C. Allen
Publikováno v:
Sensors, Systems, and Next-Generation Satellites III.
The remote sensing market is on the verge of being awash in commercial high-resolution images. Market estimates are based on the growing numbers of planned commercial remote sensing electro-optical, radar, and hyperspectral satellites and aircraft. E
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b149caac77d2e463932756c461a4f66
https://doi.org/10.1117/12.373221
https://doi.org/10.1117/12.373221