Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Patrick W.H. de Jager"'
Autor:
Hans Gijsbertsen, Maurits van der Schaar, Stefan Carolus Jacobus Antonius Keij, Giljam Derksen, Patrick W.H. de Jager, David Nijkerk
Publikováno v:
SPIE Proceedings.
The use of backscatter electron detection in a wafer alignment system has been investigated. For certain types of wafer processing such an alignment system might show improved process robustness compared to optical sensors. This expectation is based
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::209d2650dcb6ca95f0f311d0b8f1cde8
https://doi.org/10.1117/12.484962
https://doi.org/10.1117/12.484962
Autor:
Patrick W.H. de Jager, Stefan Hirscher, Rainer Kaesmaier, Hans Loeschner, Reinhard Springer, Gerhard Stengl, Karl Kragler, Andreas Wolter, Albrecht Ehrmann
Publikováno v:
SPIE Proceedings.
At the 5th NGL Workshop, 28-3OAug200l , the IPL team, headed by Infineon Technologies, has presented overhead foils1 providing an overview of results as achieved with the Ion Projection Lithography Process Development Tool (PDT) which has been develo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b0c68aa8141f24ea2370440158ba07e7
https://doi.org/10.1117/12.479338
https://doi.org/10.1117/12.479338
Autor:
Karel van der Mast, Daniel Moonen, Arno Jan Bleeker, Peter L. H. Albertino Leunissen, Patrick W.H. de Jager, Pieter Kruit
Publikováno v:
Emerging Lithographic Technologies VI.
The commercial applicability of electron beam projection lithography systems may be limited at high resolution because of low throughput. The main limitations to the throughput are: (i) Beam current. The Coulomb interaction between electrons result i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95f959093535c5414f7e8fd978c19ea3
https://doi.org/10.1117/12.472281
https://doi.org/10.1117/12.472281