Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Patrick Quéméré"'
Autor:
Patrick Quéméré, Jérôme Vaillant, Sébastien Bérard-Bergery, Pierre Chevalier, Charlotte Beylier, Jean-Baptist Henry
Publikováno v:
Journal of Microelectromechanical Systems. 30:442-455
Grayscale mask creation has for the most part been restricted to over-simplified optical and resist models usually based on a contrast curve approach. While this technique has proven to work for microstructures of large dimensions (ten to hundreds of
Autor:
Florian Castioni, Sergi Cuesta, Nicolas Bernier, Patrick Quéméré, Eric Robin, Vincent Delaye, Eva Monroy, Pascale Bayle-Guillemaud
Publikováno v:
Microscopy and Microanalysis
Microscopy and Microanalysis, 2022, 28 (S1), pp.2564-2566. ⟨10.1017/S1431927622009771⟩
Microscopy and Microanalysis, 2022, 28 (S1), pp.2564-2566. ⟨10.1017/S1431927622009771⟩
International audience
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9d267da98a88374db2ae669cce6503a6
https://hal.science/hal-03861352
https://hal.science/hal-03861352
Autor:
Marion Paris, Nacima Allouti, Sébastien Bérard-Bergery, Patrick Quéméré, Vincent Farys, Pierre Chevalier, Jérôme Vaillant, Charlotte Beylier
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
CMOS imaging has experienced significant developement in the last decades. At the center of this progress lies the pixel, composed of a light sensitive area (photodiode) coupled to a network of transistors. As the pixels sizes shrink, the light sensi
Autor:
Pierre Chevalier, Florian Tomaso, Sébastien Bérard-Bergery, Patrick Quéméré, Nacima Allouti, Bénédicte Mortini, Valérie Rousset, Rémi Coquand
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
The advance in microlithography has greatly helped the development of micro optical elements. Large array of microlenses can now be fabricated in the same fashion as manufacturing of integrated circuit at low cost and high yield [1-2]. Because microl
Autor:
Sébastien Bérard-Bergery, Jean-Baptiste Henry, Alain Ostrovsky, Maryline Cordeau, Charlotte Beylier, Patrick Quéméré, Nacima Allouti, Raphael Eleouet, Florian Tomaso, Valérie Rousset, Jérôme Hazart
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
There has been a significant increase of optical applications in the last decade, either embedded into complex multifunction devices such as smartphones, or for imaging purpose as cameras. Core of such optical systems are microlens arrays, used for l
Autor:
Chevalier, Pierre, Patrick, Quéméré, Beylier, Charlotte, Bérard-Bergery, Sébastien, Allouti, Nacima, Paris, Marion, Farys, Vincent, Vaillant, Jérôme
Publikováno v:
Proceedings of SPIE; 1/21/2019, Vol. 10958, p1-15, 15p
Publikováno v:
International Journal for Numerical Methods in Fluids. 36:391-416
A new multi-domain/multi-resolution method is presented in the framework of the large-eddy simulation (LES). The proposed treatment at the interfaces is conceived to deal with the problem of discontinuities on the characteristic length scales met in
Publikováno v:
Comptes Rendus de l'Académie des Sciences - Series IIB - Mechanics-Physics-Astronomy. 328:87-90
Resume Une procedure de couplage entre deux sous-domaines correspondant a des niveaux de description frequentielle differents de la solution est presentee et appliquee au cas de la simulation des grandes echelles. Un cadre theorique est tout d'abord
Autor:
Xavier Chevalier, Aurelien Sarrazin, Guillaume Claveau, Maxime Argoud, Nicolas Posseme, Jérôme Hazart, Christophe Navarro, Patrick Quéméré, Patricia Pimenta Barros, Raluca Tiron, Celia Nicolet
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 15:031604
Overcoming the optical limitations of 193nm immersion lithography can be achieved using Directed Self Assembly (DSA) of block-copolymers (BCPs) as a low-cost and versatile complementary technique. The goal of this paper is to investigate the potentia
Autor:
Romain Jarnias, Patrick Quéméré, Charlotte Bouet, Aurélie Le Pennec, Christophe Navarro, Guido Rademaker, Celia Nicolet, Maxime Argoud, Jérôme Reche, Raluca Tiron
Publikováno v:
Advances in Patterning Materials and Processes XXXVII
This paper introduces line roughness characterization non-straight patterns made of block copolymers (fingerprint patterns). Line Width Roughness have been determined using Power Spectral Density based on a special edge detection developed at CEA-LET
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::cd7a1c0b0b0c2b3852d203d4aab34544