Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Patrick Neefs"'
Autor:
Wim de Boeij, Bart van Bussel, Young Ha Kim, Wim Bouman, Young Seog Kang, Roelof de Graaf, Jong Hoon Jang, AJ Arij Rijke, Chansam Chang, Richard Droste, Patrick Neefs, Jeong-Heung Kong, ByeongSoo Lee, Stefan Weichselbaum
Publikováno v:
SPIE Proceedings.
Adjustment and control of the illumination pupil asymmetry is relevant for wafer alignment and overlay of lithography tools. Pupil asymmetries can cause a tilt in aerial image (Aerial Image Tilt, or AIT). This AIT, combined with a focus offset, leads
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d2a62cbae2bb86c11f34fa3481aaf32
https://doi.org/10.1117/12.2220588
https://doi.org/10.1117/12.2220588
