Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Patricia Marmillion"'
Publikováno v:
SPIE Proceedings.
Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. In 2002, a survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an ob
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f20134d01566cbdff6f4186a267f3fd1
https://doi.org/10.1117/12.798511
https://doi.org/10.1117/12.798511
Publikováno v:
SPIE Proceedings.
The feasibility of removing defects from the surface of extreme ultraviolet (EUV) substrates by nanomachining is being investigated. A commercially available atomic force microscope (AFM) based photomask repair tool was used. A specific class of defe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3f2707bafa6d4ac092f772466a0b5a5
https://doi.org/10.1117/12.686764
https://doi.org/10.1117/12.686764