Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Pat Marmillion"'
Publikováno v:
SPIE Proceedings.
Defects are still one of the main challenges of extreme ultrav iolet (EUV) mask blanks. In particular, a majority(~75%) of substrate defects are nanometer size pits . These pits are usually created during final surface polishing of the synthetic, qua
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6d1df227dc393876e0a083f766d7e80a
https://doi.org/10.1117/12.774951
https://doi.org/10.1117/12.774951
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL) is a strong contender for the 32 nm generation and beyond. A defect-free mask substrate is an absolute necessity for manufacturing EUV mask blanks. The mask blank substrates are, therefore, cleaned with differen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cce8868d8e4d61e773cb8d6497c8cf43
https://doi.org/10.1117/12.746798
https://doi.org/10.1117/12.746798
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV) substrates have stringent defect requirements. For the 32 nm node, all particles larger than 26 nm must be removed from the substrate. However, real defects are irregularly shaped and there is no clear dimension for an irreg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8889f14b1128071399303d8b4c04745c
https://doi.org/10.1117/12.712105
https://doi.org/10.1117/12.712105
Publikováno v:
23rd European Mask and Lithography Conference.
The capability of hydrogenated water to clean EUV blank substrates was examined. The hydrogenated water cleaning process was compared with an H 2 O 2 /NH 4 OH/H 2 O mixture (SC1) and ozonated water cleaning processes. A small amount ammonia added to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e7cb3490f24b578a479aedcbfb989397
https://doi.org/10.1117/12.737174
https://doi.org/10.1117/12.737174
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet lithography (EUVL) is being considered as the enabler technology for the manufacturing of future technology nodes (30 nm and beyond). EUV mask blanks are Bragg mirrors made of Mo and Si bilayers and tuned for reflectivity at a wav
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e451f2a4e04cbfe68c44b9fcd04b9e0
https://doi.org/10.1117/12.686556
https://doi.org/10.1117/12.686556
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV) mask blanks must have nearly zero defects larger than 30 nm. Mask blank defects are an accumulation of defects present on the substrate, defects added during the multilayer (ML) deposition process, and defects added by handl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7071002352d52869465c56c7857d7f41
https://doi.org/10.1117/12.686437
https://doi.org/10.1117/12.686437
Publikováno v:
22nd European Mask and Lithography Conference.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7db29758d04d120039cfb5ff67cbcab
https://doi.org/10.1117/12.692628
https://doi.org/10.1117/12.692628
Publikováno v:
SPIE Proceedings.
Defects on an extreme ultraviolet (EUV) mask blank strongly depend on the defects on the mask blank substrate. Any imperfection on the substrate surface in the form of a particle, pit, and scratch will appear on the EUV mask blank. In this article, w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbf976f16d717e136d8ee71e974bfd43
https://doi.org/10.1117/12.681841
https://doi.org/10.1117/12.681841
Autor:
Helmut Popp, Sean Eichenlaub, Abbas Rastegar, Pat Marmillion, Kurt Goncher, Sebastian Dietze, Yoshiaki Ikuta
Publikováno v:
SPIE Proceedings.
Low thermal expansion material (LTEM) substrates were cleaned with recipes developed to clean blank quartz substrates. These recipes were capable of cleaning the LTEM without damaging the LTEM substrate. No effect of etching doped metals in LTEM was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f6293ff774f9e2c1aa1fbc0ed48255cd
https://doi.org/10.1117/12.658508
https://doi.org/10.1117/12.658508
Publikováno v:
SPIE Proceedings.
Mask cleaning has been a significant challenge. Advanced PhotoMasks have proven to be even more difficult. The experimental work on 157nm systems uncovered an issue of particle growth under the pellicle. Since the mask blank had a different compositi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1975e2e1883a10a29464418b77687a0c
https://doi.org/10.1117/12.570013
https://doi.org/10.1117/12.570013