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pro vyhledávání: '"Pascal Van Cleeff"'
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 39:2872-2885
Multipatterning technology used in 7-nm technology and beyond imposes more and more complex design rules on the layout of cells. The often nonlocal nature of these new design rules is a great challenge not only for human designers but also for existi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3410ad89dbe13f90d6f6fc3b1f7158d9
https://doi.org/10.1109/tcad.2019.2962782
https://doi.org/10.1109/tcad.2019.2962782
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits & Systems; Sep2020, Vol. 39 Issue 10, p2872-2885, 14p