Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Parkson W. Chen"'
Autor:
Shiuh-Bin Chen, Stefan Dobereiner, Parkson W. Chen, Gerd Scheuring, Karl Sommer, Rik Jonckheere, Kai Peter, Frank Hillmann, Christian Gittinger, Hans-Jürgen Brück, Hans Hartmann, Thomas Schatz, Andrew C. Hourd, Vicky Philipsen, Anthony Grimshaw, Volodymyr Ordynskyy
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
The MueTec advanced CD metrology and review station, operating at the DUV (248nm) wavelength, has been extensively characterised for a number of feature types relevant to advanced (9Onm technology node) reticles. Performance for resolution capability
Autor:
Stefan Doebereiner, Anthony Grimshaw, Thomas Schatz, Andrew C. Hourd, Gordon Hughes, Parkson W. Chen, Hans-Jürgen Brück, Paul J. M. van Adrichem, Shiuh-Bin Chen, Herman Boerland, Alexander Petrashenko, Gerd Scheuring, Thomas Struck, Sigrid Lehnigk, Frank Hillmann
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
Besides the metrology performance of a CD measurement tool, its close integration into a manufacturing environment becomes more and more important. This is extremely driven by the ever increasing complexity of masks and their tightening specification
Autor:
Thomas Schaetz, Shiuh-Bin Chen, Kai Peter, Parkson W. Chen, Frank Hillmann, Karl Sommer, Hans-Jurgen Brueck, Rik Jonckheere, Andrew C. Hourd, Vicky Philipsen, Gerd Scheuring, Volodymyr Ordynskyy
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
A comparison has been made in terms of mask CD linearity measurements between the 2 tool versions of a 248nm based optical CD metrology tool for photomasks, i.e., the high-NA M5k-SWD and the through-pellicle M5k-LWD, as well as to a reticle SEM, i.e.
Autor:
Parkson W. Chen, Hans-Juergen Brueck, Christian Gittinger, Stefan Doebereiner, Gerd Scheuring, Anthony Grimshaw, Thomas Schaetz, Vicky Philipsen, Kai Peter, Shiuh-Bin Chen, Andrew C. Hourd, Hans Hartmann, Frank Hillmann, Volodymyr Ordynskyy, Karl Sommer, Rik Jonckheere
Publikováno v:
SPIE Proceedings.
The new MueTec , an advanced CD metrology and review station operating at DUV (248nm) wavelength, has been extensively characterised in a reticle production environment. Performance data including resolution, measurement repeatability and throughput
Autor:
Christian Gittinger, Parkson W. Chen, Hans-Juergen Brueck, Anthony Grimshaw, Andrew C. Hourd, Hans Hartmann, Thomas Schaetz, Rik Jonckheere, Gerd Scheuring, Shiuh-Bin Chen, Volodymyr Ordynskyy, Karl Sommer, Vicky Philipsen
Publikováno v:
SPIE Proceedings.
Critical Dimension fidelity continues to be one of the key driving parameters defining photomask quality and printing performance. The present advanced optical CD metrology systems, operating at i-line, will very soon be challenged as viable tools ow
Autor:
Parkson W. Chen
Publikováno v:
SPIE Proceedings.
Autor:
Parkson W. Chen
Publikováno v:
11th Annual BACUS Symposium on Photomask Technology.
Qualification of a reticle is a very important step for a mask shop. For defect inspection, automatic die to die inspection can detect the random defects and the die to database inspection system can detect the missing patterns as well as the pattern