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pro vyhledávání: '"Park Chul-Kyun"'
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
Extreme ultraviolet lithography (EUVL) has received a considerable attention in the semiconductor industry as a promising candidate to achieve the high resolution pattern beyond 10nm. To achieve it, pellicle is essential to prevent the reticle from p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db377b979df0da9c619cacbe55682bdb
https://doi.org/10.1117/12.2501772
https://doi.org/10.1117/12.2501772
