Batch Atomic Layer Deposition of HfO2 and ZrO2 Films Using Cyclopentadienyl Precursors

Autor: Suvi Haukka, Eva Tois, Pamela R. Fischer, Peter Zagwijn, Jacky Sirugue, Olivier Rouault, Dieter Pierreux

Publikováno v: ECS Transactions. 16:135-148

Thermal ALD deposition of ZrO2 and HfO2 films has been performed in the ASM A412(TM) 300mm vertical furnace using bis-cyclopentadienyl precursors. Due to the long precursor residence time and high surface area to be covered in a batch reactor, the th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ceaf93f0d6ac6c4a66444f57707100ac
https://doi.org/10.1149/1.2979988

Radical-Assisted Silcore(R)CVD of Si3N4 and SiO2 Nanolaminates

Autor: Peter Zagwijn, Bart Bozon, Ed Oosterlaken, Pamela R. Fischer

Publikováno v: ECS Transactions. 3:61-65

The low temperature generation of Si3N4 and SiO2 films, or nanolaminates of these films, has been developed for LPCVD vertical furnaces. These films use silcore® chemistry to deposit amorphous silicon films that are subsequently converted to silicon

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0967f090cacad8b957d13b91226a7103
https://doi.org/10.1149/1.2721474

Assembly of Amphiphilic Phenylacetylene Macrocycles at the Air−Water Interface and on Solid Surfaces

Autor: Jeffrey S. Moore, Kurt F. Stork, Pamela R. Fischer, Ashok S. Shetty, Paul W. Bohn

Publikováno v: Journal of the American Chemical Society. 118:9409-9414

The assembly of amphiphilic phenylacetylene macrocycles (PAMs), with molecular structures that vary in terms of the nature and orientation of their pendant functional groups, has been studied on a Langmuir−Blodgett trough and after transfer onto so

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3c5c5e6fe201484723678b02bdb88785
https://doi.org/10.1021/ja961549u

Novel Batch Titanium Nitride CVD Process for Advanced Metal Electrodes

Autor: Peter Zagwijn, Noureddine Adjeroud, Bankras Radko G, Michiel Van den Hout, Dieter Pierreux, Rudi Wilhelm, Martin Knapp, Gert Jan Snijders, Ed Oosterlaken, Wilco Verweij, Pamela R. Fischer

Publikováno v: ECS Transactions, 13 (1), 2009
Meeting Abstracts-Electrochemical Society, 213th ECS Meeting, Phoenix, USA, 18-22 May 2008: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment

This article describes a novel CVD process for TiN films developed in a 300 mm Vertical Furnace. We have solved Chlorine incorporation at low temperature inside the TiN layer while at the same time the batch process yields a 3 times higher throughput

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a41dc1b3a3f3e91cadad9e4733801b52
http://resolver.tudelft.nl/uuid:26380d6b-7c84-47d0-9b7c-b2225d3f293e

Low Temperature Silcore a-Silicon Deposition

Autor: Pamela R. Fischer, Steven Van Aerde, Ed Oosterlaken, Bart Bozon, Peter M. Zagwijn

Publikováno v: ECS Meeting Abstracts. :1018-1018

not Available.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c12ce6cdbce64cd27daa09e7e80267f4
https://doi.org/10.1149/ma2006-02/20/1018