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Publikováno v:
IEEE Transactions on Device and Materials Reliability. 21:129-136
In this work the influence of annealing dwell time and temperature, as well as post-annealing thermal processing treatment on copper (Cu) protrusion in Cu through-glass vias (TGVs) were studied. The Cu TGVs were made in Corning HPFS Fused Silica subs
Publikováno v:
Microelectronics Reliability. 137:114783