Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Pamburayi Mpofu"'
Autor:
Rouzbeh Samii, Anton Fransson, Pamburayi Mpofu, Pentti Niiranen, Lars Ojamäe, Vadim Kessler, Nathan J. O’Brien
Publikováno v:
Inorganic Chemistry. 61:20804-20813
Group 11 thin films are desirable as interconnects in microelectronics. Although many M-N-bonded Cu precursors have been explored for vapor deposition, there is currently a lack of suitable Ag and Au derivatives. Herein, we present monovalent Cu, Ag,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b94e208ef9eb02706591ed9d54372248
https://doi.org/10.1021/acs.inorgchem.2c03071
https://doi.org/10.1021/acs.inorgchem.2c03071
Publikováno v:
Dalton Transactions. 51:4712-4719
Indium oxide (In2O3) is an important transparent conducting material widely used in optoelectronic applications. Herein, we study the deposition of In2O3 by thermal atomic layer deposition (ALD) using our recently reported indium(iii) triazenide prec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::22160c189b4bac61f0ffb69bb9a53332
https://doi.org/10.1039/d1dt03748j
https://doi.org/10.1039/d1dt03748j
Publikováno v:
Dalton transactions (Cambridge, England : 2003). 51(12)
Indium oxide (In
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::b75a35a74ed73e14221a85d2a97c8330
https://pubmed.ncbi.nlm.nih.gov/35234773
https://pubmed.ncbi.nlm.nih.gov/35234773
Autor:
Pamburayi Mpofu
Publikováno v:
Pamburayi Mpofu
This research thesis covers work done on building an atomic layer deposition (ALD) reactor followed by the development and optimization of an ALD process for indium oxide thin films on crystalline silicon substrates from new precursors using this new
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::fef42f729c4de80a04a5c182b35843a1
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-176609
http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-176609
