Zobrazeno 1 - 10
of 251
pro vyhledávání: '"PECE"'
Publikováno v:
Al-Mustansiriyah Journal of Science, Vol 34, Iss 2 (2023)
In this investigation, n-type (100) silicon wafers with a thickness of 600 ± 25 μm and resistance of 0.1-100 μΩ were used to manufacture porous silicon. With the aid of hydrofluoric acid (HF) with a 20% concentration, a current density of 20 mA/c
Externí odkaz:
https://doaj.org/article/a0c5dc67b1c54978a42a85943dc88a0e
Publikováno v:
Journal of Applied Sciences and Nanotechnology, Vol 2, Iss 2, Pp 64-69 (2022)
Photoelectrochemical etching (PECE) was used to prepare porous silicon (PS) layers of polished surfaces of (100) n-type silicon wafers with a resistance of 0.1-100 μm and thickness of 600 ± 25 μm. The directed slices are to be catalyzed at differe
Externí odkaz:
https://doaj.org/article/2e5997dbf9084f298c77f5eef8029743