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Publikováno v:
Microelectronic Engineering. 27:409-412
A simple mathematical model has been employed to analyze quantitatively the crosslinking process in chemically amplified negative resists based on the combination of an epoxidized novolac resin and a photoacid generator. Experimental evaluation of a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::90cf77c0e9538550ee0bba99af868d56
https://doi.org/10.1016/0167-9317(94)00135-h
https://doi.org/10.1016/0167-9317(94)00135-h
