Zobrazeno 1 - 10
of 123
pro vyhledávání: '"P.V. Gray"'
Autor:
T.P. Chow, M.F. Chang, Michael S. Adler, H. Yilmaz, Bantval Jayant Baliga, P.V. Gray, G.C. Pifer
Publikováno v:
IEEE Transactions on Electron Devices. 39:1317-1321
An n-channel vertical insulated-gate bipolar transistor (IGBT) process which implements a self-aligned p/sup +/ short inside the DMOS diffusion windows is proposed and demonstrated experimentally. The salient feature of the new process is the placeme
Publikováno v:
IEEE Transactions on Electron Devices. 27:343-349
A 600-V vertical power MOSFET with low on-resistance is described. The low resistance is achieved by means of achieving near-ideal drain junction breakdown voltage and reduced drain spreading resistance from the use of an extended channel design. The
Publikováno v:
IEEE Transactions on Electron Devices. 31:817-820
A new power MOSFET has been fabricated that conducts 75 A with an on-state resistance of 0.012 Ω and blocks 60 V. The device may be used as a low-loss synchronous rectifier in efficient high-frequency power supplies or as a high-current power switch
Publikováno v:
IEEE Transactions on Electron Devices. 31:821-828
A new three-terminal power device, called the insulated gate transistor (IGT), with voltage-controlled output characteristics is described. In this device, the best features of the existing families of bipolar devices and power MOSFET's are combined
Autor:
P.V. Gray
Publikováno v:
Proceedings of the IEEE. 57:1543-1551
Study of the silicon-silicon dioxide system as a junction between a nearly ideal semiconductor and insulator has aroused both scientific and technological interest. Surface phenomena associated with this system are influenced by contamination and imp
Publikováno v:
Solid-State Electronics. 11:1105-1112
Films 2000–5000 A thick of Mo or W deposited over thin films of thermally grown SiO 2 are shown to be effective high temperature diffusion masks against both phosphorous and boron. These metal films may be precisely patterned and their diffusion ma
Publikováno v:
IEEE Electron Device Letters. 5:323-325
Two-dimensional computer modeling of insulated gate transistor (IGT) structures has been used to demonstrate the suppression of latchup in the parasitic thyristor by increasing the p-base conductivity using a deep p+ diffusion in the device cells. Ex
Autor:
Dale M. Brown, P.V. Gray
Publikováno v:
Applied Physics Letters. 8:31-33
Publikováno v:
1987 International Electron Devices Meeting.
P-channel, collector-shorted, vertical insulated gate bipolar transistors with hexagonal and square cell geometries were studied. The presence of the collector short, surrounding the edges of the device, resulted in a linear I-V region before the con
Publikováno v:
1976 International Electron Devices Meeting.
This paper describes the results of calculations and experiments relating to silicon surface characteristics and how they are altered by implanted dopant layers. Properties considered are capacitance-voltage characteristics, doping profiling methods,