Zobrazeno 1 - 10
of 184
pro vyhledávání: '"P.T. Lee"'
Publikováno v:
Journal of Materials Research and Technology, Vol 11, Iss , Pp 1895-1910 (2021)
Intermetallic compound(s) (IMC) that nucleates at the interface between solder and Cu trace during a soldering reaction, is one of the most crucial factors for microelectronic packaging reliability. This study was conducted to modify the IMC microstr
Externí odkaz:
https://doaj.org/article/e3e1564139424e4b892e43183728ab85
Publikováno v:
Journal of Materials Research and Technology, Vol 9, Iss 6, Pp 12946-12954 (2020)
Metallurgical systems containing substantial amounts of metallic indium have always been very challenging to investigate due to the difficulties involved with sample characterization caused by the substantial softness of indium. Such difficulties are
Externí odkaz:
https://doaj.org/article/32a5257f1b034bb08dd524a77c1b389a
Publikováno v:
Journal of Materials Research and Technology, Vol 11, Iss, Pp 1895-1910 (2021)
Intermetallic compound(s) (IMC) that nucleates at the interface between solder and Cu trace during a soldering reaction, is one of the most crucial factors for microelectronic packaging reliability. This study was conducted to modify the IMC microstr
Publikováno v:
Surface and Coatings Technology. 359:374-383
Publikováno v:
Surface and Coatings Technology. 350:1010-1019
Pinhole formation in electroplated Cu has been a critical reliability issue in developing through-/blind-hole (TH/BH) metallization with a thin surface-Cu feature. A mechanism of the pinhole formation has been recently proposed in a previous study, w
Publikováno v:
Applied Surface Science. 434:1353-1360
Thermal reliability of Au/Pd/Cu and Au/Pd(4–6 wt.% P)/Cu trilayers in the isothermal annealing at 180 °C were investigated by X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (TOF-SIMS), and transmission elect
Publikováno v:
Journal of The Electrochemical Society. 165:D647-D653
Akademický článek
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Akademický článek
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Publikováno v:
Surface and Coatings Technology. 320:559-567
The effects of the plating current density ( j ) on the electroplated Cu microstructure, impurity distribution, and the solderability of the electroplated Cu were investigated. Analyses of electron backscatter diffraction and transmission electron mi