Zobrazeno 1 - 10
of 42
pro vyhledávání: '"P.T. Joseph"'
Publikováno v:
Diamond and Related Materials. 20:232-237
The transition of diamond grain sizes from micron- to nano- and then to ultranano-size could be observed when hydrogen concentration is being decreased in the Ar/CH 4 plasma. When grown in H 2 -rich plasma (H 2 = 99% or 50%), well faceted microcrysta
Publikováno v:
Diamond and Related Materials. 19:927-931
Ion implantation is commonly used to modify the surface or near-surface properties of materials. In this work, plasma treated ultrananocrystalline diamond (UNCD) films were implanted using 100 and 200 keV high dose (1016 ions/cm2) nitrogen ions and a
Autor:
P.T. Joseph Fr.
Publikováno v:
NHRD Network Journal. 3:25-31
Publikováno v:
Diamond and Related Materials. 18:169-172
The electron field emission (EFE) properties of Si nanostructures (SiNS), such as Si nanorods (SiNR) and Si nanowire (SiNW) bundles were investigated. Additionally, ultrananocrystalline diamond (UNCD) growth on SiNS was carried out to improve the EFE
Publikováno v:
Journal of Nanoscience and Nanotechnology. 8:4198-4201
Different forms of diamond have been shown to have qualities as field emission sources. As a consequence, much effort has been focused on both the synthesis of diamond nanostructures to increase the field enhancement factor and understanding the emis
Publikováno v:
Diamond and Related Materials. 17:1812-1816
Nitrogen (N) ion implantation induced modification on structural and electron field emission (EFE) properties of ultrananocrystalline diamond (UNCD) films were reported. Low dose ion implantation slightly improved the EFE properties of UNCD films mai
Publikováno v:
Diamond and Related Materials. 17:476-480
Highly transparent ultrananocrystalline diamond (UNCD) films were deposited on quartz substrates using microwave plasma enhanced chemical vapor deposition (MPECVD) method. Low temperature growth of high quality transparent UNCD films was achieved by
Autor:
Wei-Chuan Fang, Huan Niu, H.Y. Huang, N.H. Tai, Umesh Palnitkar, I-Nan Lin, P.T. Joseph, Hsiu Fung Cheng
Publikováno v:
Diamond and Related Materials. 17:864-867
Ultra-nanocrystalline diamond (UNCD) films prepared by microwave plasma enhanced chemical vapor deposition were implanted using 0.3 MeV nitrogen ions under a dose of 10 13 , 10 14 , and 10 15 ions cm − 2 . While the surface morphology of the UNCD f
Publikováno v:
Journal of Electromagnetic Waves and Applications. 21:1445-1451
Nano-sized BaTiO3, SrTiO3 and TiO2 powders have been used to synthesize (Ba x ,Sr1−x )TiO3 materials via mixed oxide process. Then (Ba x ,Sr1−x )TiO3 (BST) (x = 0.5 and 0.6) with addition of high-Q (quality factor) Ba4Ti13O30 (BT) materials were
Publikováno v:
Integrated Ferroelectrics. 77:45-50
Thin films of BaxSr1−xTiO3 (BST) serial materials have the advantages of adjustable tunability and are good candidates for the application in DRAM and microwave devices. However, these films usually have loss tangent higher than the order of 0.01 a