Zobrazeno 1 - 9
of 9
pro vyhledávání: '"P.M. Muilwijk"'
Autor:
B.A.H. Nijland, Wouter Mulckhuyse, Peter Kerkhof, P.M. Muilwijk, F.T. Molkenboer, N.B. Koster, Alex Deutz, Edwin te Sligte, Michel van Putten, Peter van der Walle
Publikováno v:
Takehisa, K., XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, Photomask Japan 2017, 5-7 April 2017, 10454
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Recently TNO has established EBL2; an exposure and analysis facility for testing EUV optics, reticles and pellicles under relevant EUV scanner and source conditions. The facility and EUV source complies with the ASML power roadmap of EUV systems up t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a97063b25f5c85bb8423021635d62f2
http://resolver.tudelft.nl/uuid:7641b841-befc-459d-9944-8b7feffcaf10
http://resolver.tudelft.nl/uuid:7641b841-befc-459d-9944-8b7feffcaf10
Autor:
N.B. Koster, Alex Deutz, Joost Westerhout, P. van der Walle, E. te Sligte, F.T. Molkenboer, Wouter Mulckhuyse, Bastiaan Oostdijck, P.M. Muilwijk, M. van Putten, Peter Kerkhof
Publikováno v:
Itani, T.Ronse, K.G.Gargini, P.A.Naulleau, P.P., International Conference on Extreme Ultraviolet Lithography 2017, 11-14 September 2017, 10450
International Conference on Extreme Ultraviolet Lithography 2017
International Conference on Extreme Ultraviolet Lithography 2017
TNO has built EBL2; a facility for EUV exposure testing and surface analysis. EBL2 is capable of testing EUV optics, EUV photomasks, pellicles, and other components under controlled conditions, relevant to EUV scanner and source operation at all fore
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2f1960d0e3d7f4b278ed3ab68fc6e44
http://resolver.tudelft.nl/uuid:c01595be-12c1-4be2-8dbf-f7d89e4650a7
http://resolver.tudelft.nl/uuid:c01595be-12c1-4be2-8dbf-f7d89e4650a7
Autor:
P.M. Muilwijk, Jose Pozo, Teun C. van den Dool, S.M. Leinders, Martin D. Verweij, H. Paul Urbach, Mirvais Yousefi, W.J. Westerveld
Publikováno v:
IEEE Journal of Selected Topics in Quantum Electronics, 20 (4), 2014
Microscale strain gauges are widely used in micro electro-mechanical systems (MEMS) to measure strains such as those induced by force, acceleration, pressure or sound. We propose all-optical strain sensors based on micro-ring resonators to be integra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::65141e3c7c8a0ba17243a64b9edb2cff
https://doi.org/10.1109/jstqe.2013.2289992
https://doi.org/10.1109/jstqe.2013.2289992
Autor:
Edwin te Sligte, Michel van Putten, Peter Kerkhof, F.T. Molkenboer, Wouter Mulckhuyse, A.M. Hoogstrate, Christiaan Hollemans, B.A.H. Nijland, N.B. Koster, P.M. Muilwijk, Bastiaan Oostdijck, Alex Deutz, Peter van der Walle
Publikováno v:
Photomask Technology 2016
TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and tes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bcb9d854c23757af8bd42f90ab78f854
https://doi.org/10.1117/12.2240921
https://doi.org/10.1117/12.2240921
Autor:
Erik Tabak, S.M. Leinders, Mirvais Yousefi, P.M. Muilwijk, W.J. Westerveld, P.J. Harmsma, T. C. van den Dool, Jose Pozo, K.W.A. van Dongen, H. P. Urbach
Publikováno v:
Conference on Lasers and Electro-Optics Europe and International Quantum Electronics Conference, CLEO/Europe-IQEC 2013, 12-16 May 2013, Munich, Germany
Summary form only given. Strain gauges are widely employed in microelectromechanical systems (MEMS) for sensing of, for example, deformation, acceleration, pressure, or sound [1]. Such gauges are typically based on electronic piezoresistivity. We pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1ec70a0cf159cd0129f4e61a0f0b4c98
http://resolver.tudelft.nl/uuid:0bf5d223-280a-4e4b-a4af-eeec8f063dd7
http://resolver.tudelft.nl/uuid:0bf5d223-280a-4e4b-a4af-eeec8f063dd7
Autor:
N.B. Koster, Bastiaan Oostdijck, Christiaan Hollemans, P.M. Muilwijk, Michel van Putten, F.T. Molkenboer, Wouter Mulckhuyse, Jeroen Westerhout, Edwin te Sligte, Peter Kerkhof, Alex Deutz, B.A.H. Nijland, Peter van der Walle
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII
TNO is building EBL2 as a publicly accessible test facility for EUV lithography related development of photomasks, pellicles, optics, and other components requiring EUV exposure. EBL2 consists of a EUV Beam Line, a XPS system, and sample handling inf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0b9e4254447c811d677c45db4cf272b
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