Zobrazeno 1 - 10
of 17
pro vyhledávání: '"P.J.P.M. Simons"'
Publikováno v:
Surface and Coatings Technology. 230:239-244
Atmospheric pressure chemical vapor deposition (APCVD) of ZnO from diethyl zinc (DEZn) and t-butanol was performed using an industrial reactor design. Deposition profiles were recorded to gain insight in the position dependent variations in layer thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::95e409dc63ffdc627b4dc1672a1d8abb
https://doi.org/10.1016/j.surfcoat.2013.06.055
https://doi.org/10.1016/j.surfcoat.2013.06.055
Autor:
M. Tijssen, Mirjam Theelen, Andrea Illiberi, Miro Zeman, A.C. Janssen, P.J.P.M. Simons, J. van Deelen, Edwin H. A. Beckers, W. Zijlmans, D. Habets, B. Kniknie, Henk Steijvers
Publikováno v:
Journal of Crystal Growth. 347:56-61
Aluminum doped zinc oxide films (ZnOx:Al) have been deposited on a moving glass substrate by a metalorganic CVD process at atmospheric pressure in an in-line industrial type reactor. Tertiary-butanol has been used as an oxidant for diethylzinc and tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cce40bc4e2754b94556de6ce5bb4619d
https://doi.org/10.1016/j.jcrysgro.2012.03.007
https://doi.org/10.1016/j.jcrysgro.2012.03.007
Publikováno v:
73rd Conference on Glass Problems
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2cfe7a5cf57885d5383d3b34c5bd3615
https://doi.org/10.1002/9781118710838.ch19
https://doi.org/10.1002/9781118710838.ch19
Autor:
A.M. Lankhorst, P.J.P.M. Simons, J. van Deelen, Andrea Illiberi, Edwin H. A. Beckers, B. Kniknie
Publikováno v:
Thin Solid Films, 555, 163-168
The deposition of zinc oxide has been performed by atmospheric pressure chemical vapor deposition and trends in growth rates are compared with the literature. Diethylzinc and tertiary butanol were used as the primary reactants and deposition rates ab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5c6e7c37aafccb5773d72a47a6554f4d
http://resolver.tudelft.nl/uuid:511d7baf-3014-4ba1-bd45-46c4abde7762
http://resolver.tudelft.nl/uuid:511d7baf-3014-4ba1-bd45-46c4abde7762
Autor:
Andrea Illiberi, J. van Deelen, D. Habets, Edwin H. A. Beckers, Henk Steijvers, B. Kniknie, A.C. Janssen, P.J.P.M. Simons
Publikováno v:
2012 MRS Spring Meeting, 9-13 April 2012, San Francisco, CA, USA, 1447
Aluminum-doped zinc oxide (ZnOx:Al) films have been deposited on a moving glass substrate by a high throughput metalorganic chemical vapor deposition process at atmospheric pressure. Thin (< 250 nm) ZnOx:Al films have a poor crystalline quality, due
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::41b86d4a56e3f19eb227fb7e5f45a668
http://resolver.tudelft.nl/uuid:ffe40eed-babf-4cb9-922c-521c70b32c79
http://resolver.tudelft.nl/uuid:ffe40eed-babf-4cb9-922c-521c70b32c79
Autor:
Andrea Illiberi, J. van Deelen, P.J.P.M. Simons, B. Kniknie, D. Habets, Edwin H. A. Beckers, Henk Steijvers
Publikováno v:
2011 MRS Spring Meeting, 25 April 2011 through 29 April 2011, San Francisco, CA, USA, 1323, 75-80
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrialtype reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. ZnOx:Al films can be grown at very high deposition rates of ~ 14 nm/s f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1819b8304aac07e24f0aff4ea8027b91
http://resolver.tudelft.nl/uuid:c4290333-ab84-4bd8-8f41-24e2f63d0973
http://resolver.tudelft.nl/uuid:c4290333-ab84-4bd8-8f41-24e2f63d0973
Autor:
D. Habets, Andrea Illiberi, Edwin H. A. Beckers, A.C. Janssen, J. van Deelen, B. Kniknie, P.J.P.M. Simons, Henk Steijvers
Publikováno v:
2011 37th IEEE Photovoltaic Specialists Conference.
The results presented in this paper show that highly conductive and transparent ZnO x :Al films can be grown on glass by a high throughput industrial CVD process at atmospheric pressure. Amorphous silicon p-i-n solar cells have been grown on as depos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e92484918c8f45f54ef0936e1fbab9d7
https://doi.org/10.1109/pvsc.2011.6186688
https://doi.org/10.1109/pvsc.2011.6186688
Autor:
J. van Deelen, P.J.P.M. Simons, A.C. Janssen, Henk Steijvers, Andrea Illiberi, B. Kniknie, D. Habets, Edwin H. A. Beckers
Publikováno v:
Solar Energy Materials and Solar Cells, 7, 95, 1955-1959
26th European Photovoltaic Solar Energy Conference and Exhibition; 2319-2322
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheri
Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrial-type reactor by a metalorganic chemical vapor deposition process at atmospheri
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::394751f43c24be6cfe472e417d4bed61
http://resolver.tudelft.nl/uuid:28e80c3e-c346-4bce-80e2-c0e5df27031f
http://resolver.tudelft.nl/uuid:28e80c3e-c346-4bce-80e2-c0e5df27031f
Publikováno v:
Surface and Coatings Technology, 22-23 Spec. iss., 201, 8842-8848
For a large multi-wafer vertical batch ALD reactor, transient, 3-dimensional, multi-scale simulations have been performed for the TEMAH pulse step during a HfO2 ALD process. A bi-directional, multi-scale coupling has been established between continuu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::84414bdb5706f8dc0f15acf6e4b27bd2
http://resolver.tudelft.nl/uuid:feea696e-b889-4ea4-9f70-c65923e76608
http://resolver.tudelft.nl/uuid:feea696e-b889-4ea4-9f70-c65923e76608
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.