Výsledky vyhledávání - "P.C. Goonetilleke"

D.C. voltammetry of ionic liquid-based capacitors: Effects of Faradaic reactions, electrolyte resistance and voltage scan speed investigated using an electrode of carbon nanotubes in EMIM-EtSO4

Autor: J.P. Zheng, Dipankar Roy, G.M. Zenger, P.C. Goonetilleke, C.M. Pettit

Publikováno v: Talanta. 78:1056-1062

Carbon nanotube (CNT) electrodes in combination with ionic liquid (IL) electrolytes are potentially important for energy storage systems. We report electrochemical investigation of such a system involving a paper-electrode of multi-wall CNT (MWCNT) i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::18e8e6606f248cdb47d03843de22035b
https://doi.org/10.1016/j.talanta.2009.01.014

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Analysis of current transients for voltage pulse-modulated surface processing: Application to anodic electro-dissolution of copper for electrochemical mechanical planarization

Autor: C. M. Sulyma, Dipankar Roy, P.C. Goonetilleke

Publikováno v: Journal of Materials Processing Technology. 209:1189-1198

The voltage pulse modulation technique is useful for electrochemical processing of metal and alloy surfaces by utilizing faradaic reactions like electro-deposition and electro-dissolution. A theoretical framework is presented here to facilitate quant

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e889fae81412e5f0f95ba07d9e7d5206
https://doi.org/10.1016/j.jmatprotec.2008.03.022

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Relative roles of acetic acid, dodecyl sulfate and benzotriazole in chemical mechanical and electrochemical mechanical planarization of copper

Autor: P.C. Goonetilleke, Dipankar Roy

Publikováno v: Applied Surface Science. 254:2696-2707

The efficiency of chemical mechanical or electrochemical mechanical planarization (CMP or ECMP) carried out in the fabrication of integrated circuits is largely governed by the functional chemicals used in these processes. In this work, we study the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::54fd50c7205471745a23096d3557290e
https://doi.org/10.1016/j.apsusc.2007.10.005

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Voltage pulse-modulated electrochemical removal of copper surface layers using citric acid as a complexing agent

Autor: Dipankar Roy, P.C. Goonetilleke

Publikováno v: Materials Letters. 61:380-383

Voltage induced removal of surface layers from wiring lines is an essential component of the electrochemical mechanical planarization (ECMP) technique used for low-pressure processing of copper interconnects. Our present work examines citric acid as

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::733791ee1d5498404233cd3a9a1eecd4
https://doi.org/10.1016/j.matlet.2006.04.066

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Measurement of differential capacitance for faradaic systems under potentiodynamic conditions: Considerations of Fourier transform and phase-selective techniques

Autor: Dipankar Roy, P.C. Goonetilleke, C.M. Pettit

Publikováno v: Journal of Electroanalytical Chemistry. 589:219-231

The differential capacitance (Cdiff) technique is widely employed in studies of metal–liquid interfaces, and is particularly useful for probing electrochemical effects of surface charge variations under voltage control. For such applications, howev

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::84afee4014c451e002755a5240ed0549
https://doi.org/10.1016/j.jelechem.2006.02.012

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Electrochemical–mechanical planarization of copper: Effects of chemical additives on voltage controlled removal of surface layers in electrolytes

Autor: P.C. Goonetilleke, Dipankar Roy

Publikováno v: Materials Chemistry and Physics. 94:388-400

Chemical–mechanical planarization (CMP) of copper has now become an integral part of materials processing in the fabrication of integrated circuits. This process requires the application of a considerable down-force to the sample in its polishing s

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::522c74a2e7eca7cccd4a8895d7a94856
https://doi.org/10.1016/j.matchemphys.2005.05.020

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Probing the electrochemical double layer of an ionic liquid using voltammetry and impedance spectroscopy: a comparative study of carbon nanotube and glassy carbon electrodes in [EMIM](+)[EtSO(4)](-)

Autor: C.M. Pettit, J.P. Zheng, Dipankar Roy, P.C. Goonetilleke

Publikováno v: Talanta. 81(3)

Cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) are compared as techniques for analyzing double layer capacitances of ionic liquids (ILs) at the surfaces of two carbon-based electrodes. These systems are relevant for energy s

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6db949f222261850f1254bf453c806f6
https://pubmed.ncbi.nlm.nih.gov/20298892

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Effects of Surface-Film Formation on the Electrochemical Characteristics of LiMn[sub 2]O[sub 4] Cathodes of Lithium Ion Batteries

Autor: J.P. Zheng, Dipankar Roy, P.C. Goonetilleke

Publikováno v: Journal of The Electrochemical Society. 156:A709

4The electrochemical performance of the cathode is measured in terms of its charge capacity, rate capability, cyclability, and coulombic efficiency CE, and all these parameters are closely related to the efficiency and the reversibility of Li + inter

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::599a46ec806983a3b33bca7a8eff8d58
https://doi.org/10.1149/1.3155432

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Dissolution Inhibition in Cu-CMP Using Dodecyl-Benzene-Sulfonic Acid Surfactant with Oxalic Acid and Glycine as Complexing Agents

Autor: Suryadevara V. Babu, Dipankar Roy, Charan V. V. S. Surisetty, P.C. Goonetilleke

Publikováno v: Journal of The Electrochemical Society. 155:H971

This work demonstrates that the anionic surfactant, dodecyl-benzene-sulfonic acid (DBSA), is an effective dissolution inhibitor in chemical mechanical planarization (CMP) of Cu. Material removal rates were measured employing slurries, with and withou

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1d52ac49e9d8ef76f70cfc7bf2587d47
https://doi.org/10.1149/1.2987791

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