Zobrazeno 1 - 10
of 12
pro vyhledávání: '"P. K. Shufflebotham"'
Autor:
D. J. Thomson, P. K. Shufflebotham
Publikováno v:
Canadian Journal of Physics. 69:195-201
This paper presents preliminary measurements of the spatial variation of the plasma density, electron temperature, plasma potential, and floating voltage within a divergent magnetic field electron cyclotron resonance (ECR) plasma processing reactor.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::256fda81f4d923b22158378b28dc8dbd
https://doi.org/10.1139/p91-032
https://doi.org/10.1139/p91-032
Autor:
P. K. Shufflebotham, D. J. Thomson
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:3713-3719
Three complementary, qualitative diagnostics concerned with the global properties of electron cyclotron resonance (ECR) microwave plasmas of the type used in materials processing applications are presented. Specifically, it is first shown that both E
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::718311e704cfb5c8b69a50e82114b154
https://doi.org/10.1116/1.576484
https://doi.org/10.1116/1.576484
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 13:1862
The Sandia direct simulation Monte Carlo (DSMC) molecular/transition gas flow simulation code has significant potential as a computer‐aided design tool for the design of vacuum systems in low pressure plasma processing equipment. The purpose of thi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::211a88016210a5662a39179ad1d33434
https://doi.org/10.1116/1.587825
https://doi.org/10.1116/1.587825
Publikováno v:
Journal of Non-Crystalline Solids. 92:183-244
A review of amorphous silicon alloys (other than a-Si: H) is presented. The main focus is on experimental results. Methods of fabricating amorphous alloys are classified and their basic operational principles outlined. The electrical and optical prop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::685cfefaaf775b9de55b62a7fd297df3
https://doi.org/10.1016/s0022-3093(87)80041-8
https://doi.org/10.1016/s0022-3093(87)80041-8
Autor:
Howard C. Card, P. K. Shufflebotham, Robert D. McLeod, K. C. Kao, Douglas J. Thomson, J.F. White, S. R. Mejia, J. Shellenberg, W. Fries
Publikováno v:
Journal of Non-Crystalline Solids. :765-768
Microwave excitation of plasmas undergoing electron cyclotron resonance (ECR) have been used to fabricate silicon films with a wide range of properties that include micro-crystalline Si:H (uc-Si) and a-Si:H. Under ECR conditions the microwave power e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fb12ad901d3130880fd0cfe10d0929f8
https://doi.org/10.1016/0022-3093(85)90772-0
https://doi.org/10.1016/0022-3093(85)90772-0
Publikováno v:
Journal of Applied Physics. 60:2036-2040
Amorphous silicon–tellurium alloy thin films were fabricated by coevaporation over the composition range of 0–82 at. % Te. The electronic and optical properties of these films were systematically investigated over this same range of composition.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6b89e385bdf9a452c9376b353867abc9
https://doi.org/10.1063/1.337205
https://doi.org/10.1063/1.337205
Publikováno v:
Journal of Applied Physics. 64:688-693
Spectroscopic ellipsometry and x‐ray diffraction measurements have been used to obtain structural information on hydrogenated amorphous and microcrystalline silicon thin films. The films were deposited onto quartz substrates from a microwave plasma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8539fd5e3228a4c0d387a9628f7d4d5
https://doi.org/10.1063/1.341962
https://doi.org/10.1063/1.341962
Autor:
T.T. Chau, P. K. Shufflebotham, Howard C. Card, K. C. Kao, T. V. Herak, James Schellenberg, Robert D. McLeod, S. R. Mejia
Publikováno v:
Journal of Non-Crystalline Solids. :277-280
The optical, electronic, and structural properties of a-Si:H films deposited by ECR microwave plasmas at 10−3 torr have been studied as functions of substrate bias. Films deposited on quartz and stainless steel substrates with their surfaces normal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e1a351eccd8b060041085c4b309a021
https://doi.org/10.1016/0022-3093(87)90066-4
https://doi.org/10.1016/0022-3093(87)90066-4
Publikováno v:
Journal of Applied Physics. 64:4398-4403
The behavior of electron‐cyclotron resonant (ECR) and non‐ECR H2 plasmas generated in a microwave plasma chemical‐vapor deposition reactor have been studied as a function of magnetic field strength and absorbed microwave power. Plasma diagnosti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b501d6c07266a87104a645356bfe3876
https://doi.org/10.1063/1.342467
https://doi.org/10.1063/1.342467
Publikováno v:
Journal of Non-Crystalline Solids. 103:125-130
Amorphous and microcrystalline silicon films have been fabricated by microwave plasmas in a silane-hydrogen gas mixture under electron cyclotron resonance (ECR) conditions. Optical properties of these films have been measured for photon energies in t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::351f43a5342cff060b726c326860bfc4
https://doi.org/10.1016/0022-3093(88)90424-3
https://doi.org/10.1016/0022-3093(88)90424-3