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pro vyhledávání: '"P. J. Louris"'
Publikováno v:
Journal of The Electrochemical Society. 144:2859-2864
One of the most used diagnostics for characterizing silica thin films is the etch rate (ER) in acidic, fluoride-based solutions. The ER measurement is relatively easy, fast, and cheap, which makes it attractive as an in-process monitor. For microelec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd2cca0077005b1c6581c0164fba2e2a
https://doi.org/10.1149/1.1837908
https://doi.org/10.1149/1.1837908
