Zobrazeno 1 - 5
of 5
pro vyhledávání: '"P. J. Louris"'
Publikováno v:
Journal of The Electrochemical Society. 144:2859-2864
One of the most used diagnostics for characterizing silica thin films is the etch rate (ER) in acidic, fluoride-based solutions. The ER measurement is relatively easy, fast, and cheap, which makes it attractive as an in-process monitor. For microelec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cd2cca0077005b1c6581c0164fba2e2a
https://doi.org/10.1149/1.1837908
https://doi.org/10.1149/1.1837908
Autor:
Walmsley, B. A., Liu, Y., Hu, X. Z., Bush, M. B., Winchester, K. J., Martyniuk, M., Dell, J. M., Faraone, L.
Publikováno v:
Journal of Applied Physics; 8/15/2005, Vol. 98 Issue 4, p044904, 6p, 1 Black and White Photograph, 1 Diagram, 9 Graphs
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2001, Vol. 19 Issue 5, p2670-2675, 6p
Autor:
Bin Zhu, Lynch, David M., Chen-yang Chung, Ast, Dieter G., Greene, Raymond G., Thompson, Michael O.
Publikováno v:
ECS Journal of Solid State Science & Technology; 2015, Vol. 4 Issue 5, pQ43-Q45, 3p
Autor:
Richard Brown
In 1991 this author published a monograph[l] based on his experience teaching microwave hybrid materials and processing technology at the annual ISHM (now the International Microelectronics and Packaging Society, IMAPS) symposia. Since that time, the
