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pro vyhledávání: '"P. J. Beckage"'
Publikováno v:
Journal of Materials Science. 33:4375-4379
The crystallization of thin amorphous TaOx films formed by d.c. reactive sputtering was investigated at temperatures from 500–700 °C. The films remained amorphous for times up to 100 h at 500 °C. The formation of discrete, single crystallites of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d76f738bfec4e3044649cfffc9d4f414
https://doi.org/10.1023/a:1004484915386
https://doi.org/10.1023/a:1004484915386
