Zobrazeno 1 - 1
of 1
pro vyhledávání: '"P. F. Kurunczi"'
Publikováno v:
AIP Conference Proceedings.
Supplying low energy electrons to insure neutralization of implanted wafers requires an advanced charge control system. Some devices are extremely sensitive to low levels of metal contamination. We have designed a radio frequency (rf) plasma flood gu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a6ee57e6dc070c4c8af4657124225d34
https://doi.org/10.1063/1.2401552
https://doi.org/10.1063/1.2401552
