Zobrazeno 1 - 5
of 5
pro vyhledávání: '"P. D. Kinney"'
Publikováno v:
MRS Proceedings. 523
New analytical techniques are being employed to meet the stringent requirements for controlling defects in semiconductor manufacturing. While SEM/EDX continues to be an effective tool for root-cause analysis of particles and defects on the wafer surf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9eea31cb2c8fde859abf0c087d574b73
https://doi.org/10.1557/proc-523-65
https://doi.org/10.1557/proc-523-65
Publikováno v:
Microscopy and Microanalysis. 5:742-743
Development of future semiconductor processes and improving existing ones requires a strong capability to identify and eliminate the sources of particle defects. The current industry approach for accomplishing this task is to analyze the particles on
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd11e95224d786afef6b59c64e613512
https://doi.org/10.1017/s1431927600017037
https://doi.org/10.1017/s1431927600017037
Publikováno v:
Blood; May 1963, Vol. 21 Issue: 5 p546-552, 7p
Autor:
A. Johnsono, Peter Coon, C. Ayre, Yuri Uritsky, W.F. Steele, F. Gozzo, H. Fujimoto, Howard A. Padmore, T. Renner, G.D. Ackermann, B. Sheridan, R. Ynzunza, P. D. Kinney, Zahid Hussain, Baylor B. Triplett
Publikováno v:
Scopus-Elsevier
Chemical analysis on a microscopic scale was performed on a TiN particle sample on silicon and on two patterned samples using a synchrotron source scanning photoemission microscope. For all the experiments, we exploit the ability, developed in our ex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::02f99fd601cbe904d50c17199622b0bb
http://www.scopus.com/inward/record.url?eid=2-s2.0-0031627926&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-0031627926&partnerID=MN8TOARS
