Zobrazeno 1 - 10
of 10
pro vyhledávání: '"P R Varanasi"'
Autor:
Nicolás M. Suárez, Tina Ganzenmueller, Jasper Götting, Andrew J. Davison, Akshay Dhingra, Thomas F. Schulz, Jasmin Zischke, Penelope C. Kay-Fedorov, Eva M. Weissinger, P R Varanasi, Albert Heim, Lars Steinbrueck, Salvatore Camiolo
Publikováno v:
Medical Microbiology and Immunology
Human cytomegalovirus (HCMV) is an important opportunistic pathogen in allogeneic haematopoietic stem cell transplant (HSCT) recipients. High-throughput sequencing of target-enriched libraries was performed to characterise the diversity of HCMV strai
Autor:
Adriana Tomić, Pavankumar R Varanasi, Mijo Golemac, Suzana Malić, Peggy Riese, Eva M Borst, Eva Mischak-Weissinger, Carlos A Guzmán, Astrid Krmpotić, Stipan Jonjić, Martin Messerle
Publikováno v:
PLoS Pathogens, Vol 12, Iss 12, p e1006015 (2016)
Development of an effective vaccine against human cytomegalovirus (HCMV) is a need of utmost medical importance. Generally, it is believed that a live attenuated vaccine would best provide protective immunity against this tenacious pathogen. Here, we
Externí odkaz:
https://doaj.org/article/84d62115fc0a45c8b0f013b940cf52d3
Autor:
Carola E Bunse, Sylvia Borchers, Pavankumar R Varanasi, Sabine Tischer, Constança Figueiredo, Stephan Immenschuh, Ulrich Kalinke, Ulrike Köhl, Lilia Goudeva, Britta Maecker-Kolhoff, Arnold Ganser, Rainer Blasczyk, Eva M Weissinger, Britta Eiz-Vesper
Publikováno v:
PLoS ONE, Vol 8, Iss 12, p e77925 (2013)
Adoptive transfer of antiviral T cells enhances immune reconstitution and decreases infectious complications after stem cell transplantation. Information on number and function of antiviral T cells in stem cell grafts is scarce. We investigated (1) i
Externí odkaz:
https://doaj.org/article/a9f01e125ea34d9288e1da941e88a927
Publikováno v:
Journal of Photopolymer Science and Technology. 23:173-184
We are introducing a new family of fluorine-free photoacid generators (PAGs) for use in 193 nm lithography. These PAGs are based on percyano-substituted cyclopentadienide anions and do not contain sulfonate groups. PAGs with these weakly coordinating
Autor:
Ranee Wai-Ling Kwong, Sen Liu, W. Li. Khojasteh, P. R. Varanasi, Rex Chen, Irene Popova, Margaret C. Lawson
Publikováno v:
Journal of Photopolymer Science and Technology. 20:481-491
The combination of immersion lithography and reticle enhancement techniques (RETs) has extended 193nm lithography into the 45nm node and possibly beyond. In order to fulfill the tight pitch and small critical dimension requirements of these future te
Autor:
Kuang-Jung J. Chen, Mahmoud Khojasteh, Hiroshi Ito, Wu-Song S. Huang, P. R. Varanasi, Dirk Pfeiffer, Robert D. Allen, H. D. Truong, Sean D. Burns, Wai-kin Li
Publikováno v:
Polymers for Advanced Technologies. 17:104-115
This paper reviews IBM's 193 nm resist development efforts, placing an emphasis on the systems employing fluoroalcohol as an acidic group. Polymethacrylates were initially selected as a platform for their good transparency at 193 nm and then the emph
Autor:
Mahmoud Khojasteh, Margaret C. Lawson, Gary Dabbagh, Linda K. Sundberg, Y. Nishiyama, Kuang-Jung J. Chen, Tsutomu Shimokawa, M. Siezak, Takashi Chiba, P. J. Brock, Ranee Wai-Ling Kwong, R. Sooriyakumaran, Wai-kin Li, P. R. Varanasi, Robert D. Allen, Kaushal Patel, Z. Liu
Publikováno v:
Journal of Photopolymer Science and Technology. 18:381-387
We have designed and developed a variety of hexafluoroalcohol (HFA) pendant methacrylate monomers and the corresponding imaging polymers for ArF lithography. It was found that HFA side chains are critical for "swelling free" dissolution properties fo
Autor:
D. V. Casmier, Hiroshi Ito, Robert D. Allen, Carl E. Larson, Donald C. Hofer, P. R. Varanasi, Juliann Opitz, R. Sooriyakumaran, Thomas I. Wallow
Publikováno v:
Journal of Photopolymer Science and Technology. 12:501-507
This paper will describe the strengths and unique challenges of building 193nm resists from acrylic polymers and cyclic olefin polymers. In particular, cyclic olefin (alternating) copolymer synthesis and properties will be discussed.
Autor:
Christopher D. Sheraw, Colin J. Brodsky, Xiaojun Yu, Karen A. Nummy, P. R. Varanasi, Naftali E. Lustig, Gregory G. Freeman, Emmanuel F. Crabbe, Sameer H. Jain, Shreesh Narasimha, Sujatha Sankaran, James P. Norum, D. Corliss, Subramanian S. Iyer, Geng Wang, Paul C. Parries, Anthony I. Chou, Vincent J. McGahay, M. E. Weybright, Paul D. Agnello
Publikováno v:
IBM Journal of Research and Development. 55:5:1-5:14
The 45-nm technology, called 12S and developed for IBM POWER7®, is an extremely robust and versatile technology platform that allows for a rich set of features that include embedded dynamic random access memory (DRAM), performance and dense static R
Autor:
H. Ito, H. D. Truong, R. D. Allen, W. Li, P. R. Varanasi, K.‐J. Chen, M. Khojasteh, W.‐S. Huang, S. D. Burns, D. Pfeiffer
Publikováno v:
Polymers for Advanced Technologies; Feb2006, Vol. 17 Issue 2, p104-115, 12p