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pro vyhledávání: '"Oxana Chamirian"'
Autor:
Oxana Chamirian, Muriel De Potter, Karen Maex, Jorge Kittl, Judit G. Lisoni, Mark Van Dal, Olivier Richard, Anne Lauwers, Richard Lindsay, Amal Akheyar
Publikováno v:
MRS Proceedings. 765
An overview of silicide development for the 65 nm node and beyond is presented. The scaling behavior of Co based and Ni based silicides to sub-100 nm junctions and sub-40 nm gate lengths was investigated. Co and Co-Ni silicides required a high therma
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::53e20712dc83f4d8baed239b0cee127b
https://doi.org/10.1557/proc-765-d7.5
https://doi.org/10.1557/proc-765-d7.5
