Zobrazeno 1 - 10
of 54
pro vyhledávání: '"Owen Hu"'
Publikováno v:
Journal of Microelectronic Manufacturing, Vol 3, Iss 2 (2020)
Fin field-effect transistor (FinFET) technology has been introduced to the mainstream complementary metal-oxide semiconductor (CMOS) manufacturing for low-power and high-performance applications. However, advanced FinFET nodes are facing significant
Externí odkaz:
https://doaj.org/article/35d18086208c40878c8db087446461c6
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a85d53af24a27ac454b6de0d5be702ea
https://doi.org/10.1109/asmc57536.2023.10121129
https://doi.org/10.1109/asmc57536.2023.10121129
Autor:
Dewei Xu, Junyang Chen, Jimmy Koh, Emiko Motoyama, Meena Rajachidambaram, Jean Raymond Fakhoury, Radhika Kamlapurkar, Rachel Gantt, Daniel Palmieri, J. Nicholas Alexander, Bas Korevaar, Edward Gordon, Thomas Kauerauf, Teck Jung Tang, Robert Fox, Seung-Yeop Kook, Owen Hu
Publikováno v:
2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54f3b90aedb94f6e7dd6d4f5b1d396f1
https://doi.org/10.1109/asmc57536.2023.10121096
https://doi.org/10.1109/asmc57536.2023.10121096
Publikováno v:
2022 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a54ebb92aa9fbf795dab853c9d615d69
https://doi.org/10.1109/vlsi-tsa54299.2022.9771011
https://doi.org/10.1109/vlsi-tsa54299.2022.9771011
Autor:
Tim Michael Jackson, Kanesha Ward, Shannon Saad, Sarah J White, Shila Poudel, Freya Raffan, Sue Amanatidis, Jenna Bartyn, Owen Hutchings, Enrico Coiera, Kevin Chan, Annie Y S Lau
Publikováno v:
JMIR Research Protocols, Vol 13, p e58683 (2024)
BackgroundVirtual care is increasingly incorporated within routine health care settings to improve patient experience and access to care. A patient’s experience encompasses all the interactions an individual has with the health care system. This in
Externí odkaz:
https://doaj.org/article/8d3f3a29171444eea415509f0eb495e0
Autor:
Andrea Torres-Robles, Melissa Baysari, Karen Allison, Miranda Shaw, Owen Hutchings, Warwick J Britton, Andrew Wilson, Simon K Poon
Publikováno v:
Digital Health, Vol 10 (2024)
Objective This study aims to develop a measurement model for health technology acceptability using a theoretical framework and a range of validated instruments to measure user experience, acceptance, usability, health and digital health literacy. Met
Externí odkaz:
https://doaj.org/article/6387417bef87483dacfc8d6ee3962d24
Autor:
Alla Melman, Min Jiat Teng, Danielle M Coombs, Qiang Li, Laurent Billot, Thomas Lung, Eileen Rogan, Mona Marabani, Owen Hutchings, Chris G Maher, Gustavo C Machado
Publikováno v:
JMIR Research Protocols, Vol 13, p e60298 (2024)
Externí odkaz:
https://doaj.org/article/05fd50d34eb34e4aa2fbd34c02ee0a3f
Autor:
Xiaoli He, Shimpei Yamaguchi, Owen Hu, Zeynel Bayindir, Chloe Yong, Srikanth Samavedam, Hyuck Soo Yang, Dong Kyun Sohn, Suresh Uppal, Manoj Joshi, Purushothaman Srinivasan, Dongil Choi
Publikováno v:
Microelectronics Reliability. 72:80-84
In this work, we investigated the effect of so-called WF (Work Function) setting anneal (high temperature annealing on TiN/HfO 2 stack) on gate stack properties. It was found that intermixed layer created in-between TiN and HfO 2 during WF setting an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9457a506b54889f3e120aa462ed7c14
https://doi.org/10.1016/j.microrel.2017.04.004
https://doi.org/10.1016/j.microrel.2017.04.004
Autor:
Suresh Uppal, Talapady Srivatsa Bhat, Shimpei Yamaguchi, Hui Zhan, Xiaobo Chen, Jianghu Yan, Shashidhar Shintri, Suresh Regonda, Yong Jun Shi, Srikanth Samavedam, Qi Yi, Hsien-Ching Lo, Yan Ping Shen, Dongil Choi, Owen Hu, Manoj Joshi, Jianwei Peng, Chloe Yong, Hong Wei, Baofu Zhu
Publikováno v:
ECS Journal of Solid State Science and Technology. 6:N137-N141
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39395ed3644bd0dbf5ce4571033e3367
https://doi.org/10.1149/2.0011709jss
https://doi.org/10.1149/2.0011709jss
Publikováno v:
AgriEngineering, Vol 5, Iss 3, Pp 1216-1225 (2023)
Fusarium ear rot (FER) is a common disease in maize caused by the pathogen Fusarium verticillioides. Because of the quantitative nature of the disease, scoring disease severity is difficult and nuanced, relying on various ways to quantify the damage
Externí odkaz:
https://doaj.org/article/4c743aa14777456497ad8ebea332d201