Low-Resistance Ultrashallow Extension Formed by Optimized Flash Lamp Annealing.

Autor: Ito, Takayuki, Suguro, Kyoichi, Tamura, Mizuki, Taniguchi, Toshiyuki, Ushiku, Yukihiro, Iinuma, Toshihiko, Itani, Takaharu, Yoshioka, Masaki, Owada, Tatsushu, Imaoka, Yasuhiro, Murayama, Hiromi, Kusuda, Tatasufumi

Publikováno v: IEEE Transactions on Semiconductor Manufacturing; Aug2003, Vol. 16 Issue 3, p417-422, 6p, 3 Black and White Photographs, 16 Graphs