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pro vyhledávání: '"Ouma, Dennis"'
Autor:
Ouma, Dennis Okumu
Thesis (Ph.D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, February 1999.
Includes bibliographical references (p. 223-238).
Chemical mechanical polishing (CMP) has emerged as the dielectric
Includes bibliographical references (p. 223-238).
Chemical mechanical polishing (CMP) has emerged as the dielectric
Externí odkaz:
http://hdl.handle.net/1721.1/9704
Autor:
Ouma, Dennis Okumu
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.
Includes bibliographical references (leaves 87-89).
by Dennis Okumu Ouma.
M.Eng.
Includes bibliographical references (leaves 87-89).
by Dennis Okumu Ouma.
M.Eng.
Externí odkaz:
http://hdl.handle.net/1721.1/37032
Akademický článek
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Autor:
Yuan, David, Ahamed, Alisha, Burgin, Josephine, Cummins, Carla, Devraj, Rajkumar, Gueye, Khadim, Gupta, Dipayan, Gupta, Vikas, Haseeb, Muhammad, Ihsan, Maira, Ivanov, Eugene, Jayathilaka, Suran, Kadhirvelu, Vishnukumar Balavenkataraman, Kumar, Manish, Lathi, Ankur, Leinonen, Rasko, McKinnon, Jasmine, Meszaros, Lili, O'Cathail, Colman, Ouma, Dennis
Publikováno v:
Nucleic Acids Research; 1/5/2024, Vol. 52 Issue D1, pD92-D97, 6p
Rapid characterization and modeling of pattern-dependent variation in chemical-mechanical polishing.
Autor:
Stine, Brian E., Ouma, Dennis O., Divecha, Rajesh R., Boning, Duane S., Chung, James E., Hetherington, Dale L., Harwood, C. Randy, Nakagawa, O. Samuel, Soo-Young Oh
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. Feb98, Vol. 11 Issue 1, p129. 12p. 4 Black and White Photographs, 9 Diagrams, 2 Charts, 20 Graphs.
Autor:
Ouma, Dennis O., Stine, Brian, Divecha, Rajesh, Boning, Duane S., Chung, James E., Shinn, Gregory B., Ali, Iqbal, Clark, John
Publikováno v:
Proceedings of SPIE; Nov1997, Issue 1, p236-247, 12p