Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Ou, Keiyu"'
Autor:
Guerrero, Douglas, Amblard, Gilles R., Ou, Keiyu, Tango, Naohiro, Fujimaki, Nishiki, Marumo, Kazuhiro, Hiura, Nobuhiro, Takahashi, Satomi, Fujimori, Toru
Publikováno v:
Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129570W-129570W-6, 1166137p
Autor:
Naulleau, Patrick P., Gargini, Paolo A., Itani, Toshiro, Ronse, Kurt G., Ou, Keiyu, Tango, Naohiro, Fujimori, Toru
Publikováno v:
Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500A-127500A-8, 1147509p
Autor:
Guerrero, Douglas, Amblard, Gilles R., Ou, Keiyu, Tango, Naohiro, Fujimaki, Nishiki, Marumo, Kazuhiro, Hiura, Nobuhiro, Takahashi, Satomi, Fujimori, Toru
Publikováno v:
Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p124980D-124980D-7, 1124828p
Akademický článek
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Publikováno v:
Proceedings of SPIE; 12/19/2023, Vol. 12750, p127500A-127500A-8, 1p
Autor:
Ou Keiyu, Nanae Muraki, Takashi Yakushiji, Asakawa Daisuke, Naoya Hatakeyama, Mitsuhiro Fujita, Yasunori Yoneyama, Tadashi Omatsu, Shirakawa Michihiro, Toru Fujimori
Publikováno v:
2016 International Symposium on Semiconductor Manufacturing (ISSM).
Negative tone imaging (NTI) is a method for obtaining a negative-tone reversal pattern by developing with an organic solvent. As NTI process can break-through the resolution limit of a conventional positive-tone development (PTD) process, it has been
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96ac010eb61109be11eda994c46d42a4
https://doi.org/10.1109/issm.2016.7934529
https://doi.org/10.1109/issm.2016.7934529
Autor:
Asakawa Daisuke, Ou Keiyu, Tadashi Omatsu, Hatakeyama Naoya, Takashi Yakushiji, Shirakawa Michihiro, Mitsuhiro Fujita, Yasunori Yonekuta, Nanae Muraki
Publikováno v:
SPIE Proceedings.
Negative tone imaging (NTI) process is a method for obtaining a negative-tone reversal pattern by developing with an organic solvent. As NTI process can break-through the resolution limit of a conventional positive tone development (PTD) process at s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba7f10e91f6b8e2ed6d368f6f71de20f
https://doi.org/10.1117/12.2218939
https://doi.org/10.1117/12.2218939
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
The high volume manufacturing with extreme ultraviolet (EUV) lithography is delaying due to its light source issue. Therefore, ArF-immersion lithography has still been the most promising technology for down scaling of device pitch. As the limitation
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::410de8c8d094cc65a2b51bbbce1eb1c5
https://doi.org/10.1117/12.2085745
https://doi.org/10.1117/12.2085745
Autor:
Ou, Keiyu, Tango, Naohiro, Fujimaki, Nishiki, Marumo, Kazuhiro, Hiura, Nobuhiro, Takahashi, Satomi, Fujimori, Toru
Publikováno v:
Proceedings of SPIE; 4/11/2023, Vol. 12498, p124980D-124980D-7, 1p
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
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